Antireflective Surface Structures via 3D Etch Mask

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Solution Overview

Problem

Materials without local variation in physical and chemical properties pose challenges in fabricating random antireflective surface structures (ARSS) using reactive ion etching, as they do not form ARSS spontaneously, limiting the application of ARSS to certain materials like glasses.

Innovation Solution

A method involving the application of a three-dimensional film layer on the optical element, followed by etching to create ARSS, allowing for the formation of ARSS on materials that lack inherent local variations, with feature dimensions varying between 0.1 and 10 times the wavelength for reduced reflection, and peak-to-peak heights varying between 0.1 and 10 times half the wavelength.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If reactive ion etching is used to fabricate random ARSS, then ARSS can be formed on materials with local variation in physical and chemical properties, but materials without such local variation cannot form ARSS spontaneously

Engineering Contradiction:
Improvematerial compatibilityVSAvoidfabrication difficulty
Core Design Contradiction:
Adaptability or versatilityVSEase of manufacture

Solution Approach 1:

A three-dimensional film layer is introduced as an intermediary between the planar mask and the optical element surface. This film layer undergoes anisotropic etching to form three-dimensional structures that serve as templates for subsequent ARSS formation on the optical element, enabling ARSS fabrication on materials that would not spontaneously form such structures

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention transitions from two-dimensional planar mask patterns to three-dimensional film structures through anisotropic etching. This dimensional transformation creates vertical sidewalls and tapered structures that enable ARSS formation on a broader range of materials by providing the necessary structural complexity that planar masks cannot achieve

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Adaptability or versatility

If traditional thin film dielectric stacks are used to reduce Fresnel reflections, then reflectance can be reduced for limited spectral and angular ranges, but achieving broader spectral and angular performance requires many layers increasing complexity and cost

Engineering Contradiction:
Improvespectral and angular bandwidthVSAvoidnumber of layers
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent creates local variations in surface topology through three-dimensional etched structures, where different regions of the surface have different heights and orientations. This local structural diversity provides broadband and wide-angle antireflection performance without requiring multiple sequential dielectric layers, as each local structure independently contributes to the overall antireflection effect across different wavelengths and angles

Inventive Principle:
Principle #3Local quality

3Object-affected harmful factors

If dielectric AR coatings are applied to optical surfaces, then Fresnel reflections are reduced, but the coatings exhibit lower laser induced damage thresholds and are subject to environmental degradation and delamination

Engineering Contradiction:
ImproveFresnel reflectionVSAvoidlaser damage threshold and environmental stability
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

The invention extracts the antireflection function from separate dielectric coating layers and integrates it directly into the optical element surface through etching. By removing the need for additional dielectric materials and creating the ARSS directly on the substrate, the solution eliminates the inherent weaknesses of dielectric coatings including low laser damage thresholds, environmental degradation, and delamination issues while maintaining the antireflection benefit

Inventive Principle:
Principle #2Taking out (Extraction)

4Object-affected harmful factors

If dielectric AR coatings are used to reduce reflections, then Fresnel reflections are minimized, but strong polarization effects occur with optical properties depending on incident light polarization

Engineering Contradiction:
ImproveFresnel reflectionVSAvoidpolarization independence
Core Design Contradiction:
Object-affected harmful factorsVSEase of operation

Solution Approach 1:

The three-dimensional etched structures exhibit asymmetric geometries with varying heights, orientations, and sidewall angles that are optimized to provide polarization-independent antireflection. The asymmetric local structures interact with both s-polarized and p-polarized light in similar ways, eliminating the strong polarization effects that characterize traditional dielectric coatings and enabling consistent performance across different polarization states

Inventive Principle:
Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the creation of ARSS on a wide range of optical materials, including monocrystalline and polycrystalline materials, achieving reduced surface reflections, increased transmission, and higher laser-induced damage thresholds, with broadband spectral performance and reduced polarization dependence.

Implementation Method 1

Processing of these structures does not involve a permanent coating on the optic, but instead relies on nano-patterning of the surface of the optical material itself

Methodology Applied
Scientific EffectReactive ion etching: Plasma

Implementation Method 2

Each surface of an optical surface (such as a lens, a window, or the end face of an optical fiber) reflects some portion of the light incident upon it. These reflections, known as 'Fresnel reflections'

Methodology Applied
Scientific EffectFresnel reflection: Reflection

Implementation Method 3

Lord Rayleigh in 1879 that a gradual transition in refractive index could serve to nearly eliminate the reflectance from a surface

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS11035984B2Anti-reflective surface structures formed using three-dimensional etch mask
Publication Date: 2021.06.15 THE GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY DEPARTMENT OF HEALTH & HUMAN SERVICES
  • US11035984B2 patent drawing
  • US11035984B2 patent drawing
  • US11035984B2 patent drawing

AI summary

The invention relates to methods for fabricating antireflective surface structures (ARSS) on an optical element using a three-dimensional film layer applied to the surface of the optical element. The methods beneficially permit materials that do not exhibit local variation in physical and chemical properties to be provided with ARSS. Optical elements having ARSS on at least one surface are also provided.