Aperture Array Measurement Structure with Recessed Support Base

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Solution Overview

Problem

Existing measurement structures using thin metal mesh aperture arrays for electromagnetic wave analysis face challenges in maintaining sensitivity due to the need for a support base, which occupies the principal surface area where sensitivity is maximum, limiting efficient specimen measurement.

Innovation Solution

A measurement structure with a metal aperture array and a support base where at least one principal surface closer to the support base is not contacted, allowing for increased sensitivity by maintaining the region near the principal surface vacant and utilizing recesses on the support base for specimen containment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If a support base is used to maintain the aperture array structure in a not-flexing state, then the structural stability is improved, but the area available for specimen measurement is reduced

Engineering Contradiction:
Improvestructural stabilityVSAvoidarea available for specimen measurement
Core Design Contradiction:
Stability of the object's compositionVSArea of stationary object

Solution Approach 1:

The support base is segmented to form recesses that do not extend to the principal surfaces of the aperture array structure. This segmentation allows the support base to provide structural stability while leaving the principal surface areas free for specimen measurement, resolving the contradiction between stability and measurement area.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The support base design extracts or removes the conflicting function of occupying principal surface area. By forming recesses that stop before reaching the principal surfaces, the support base is extracted from the measurement-critical region, allowing it to provide stability without compromising the area available for specimen measurement.

Inventive Principle:
Principle #2Taking out (Extraction)

2Measurement precision

If the aperture array structure is made thinner to increase detection sensitivity, then the detection sensitivity is improved, but the manufacturing difficulty increases

Engineering Contradiction:
Improvedetection sensitivityVSAvoidmanufacturing difficulty
Core Design Contradiction:
Measurement precisionVSEase of manufacture

Solution Approach 1:

The invention addresses the thin aperture array structure by utilizing the third dimension (depth of recesses in the support base) to provide support. Instead of trying to make the aperture array itself thicker, the solution moves to another dimension by creating deep recesses in the support base, allowing the aperture array to remain thin for high sensitivity while being adequately supported.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enhances detection sensitivity and efficiency, even with small specimen amounts, and facilitates easy manufacturing using MEMS techniques, allowing for high-sensitivity and high-efficiency characteristic measurement.

Implementation Method 1

applying an electromagnetic wave to the aperture array structure on which the specimen is held, and analyzing a transmittance spectrum of the electromagnetic wave

Methodology Applied
Scientific EffectElectromagnetic wave transmission: Electromagnetic Induction

Implementation Method 2

a change of frequency characteristics is caused due to the interaction between an electromagnetic field localized on the surface of the aperture array structure and the specimen

Methodology Applied
Scientific EffectElectromagnetic field localization: Electric Field

Data Source

PatentUS8912497B2Measurement structure, method of manufacturing same, and measuring method using same
Publication Date: 2014.12.16 MURATA MFG CO LTD
  • US8912497B2 patent drawing
  • US8912497B2 patent drawing
  • US8912497B2 patent drawing

AI summary

A measurement structure including an aperture array structure made of a metal and having a plurality of aperture portions, and a support base supporting the aperture array structure. The measurement structure is used in a measuring method by applying an electromagnetic wave to the measurement structure on which a specimen is held, detecting frequency characteristics of the electromagnetic wave transmitted through the measurement structure or reflected by the measurement structure, and measuring characteristics of the specimen. At least a first part of a surface of the aperture array structure proximal to the support base is joined to the support base, and at least a second part of the surface of the aperture array structure defines at least part of the plurality of aperture portions, the second part of the surface being proximal to the support base and not in contact with the support base.