Interchangeable Aperture Arrays for Fast Electron Microscope Mode Switching
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Solution Overview
Problem
Charged particle beam devices, such as electron microscopes, face challenges in efficiently switching between operation modes due to the need for extensive hardware changes and recalibrations, which are time-consuming and require skilled personnel, affecting throughput and efficiency.
Innovation Solution
A movable stage with aperture arrays that can be aligned with the charged particle beam to change aperture sizes and beam currents without deflecting the beam, allowing for quick switching between different resolution and current values, and utilizing electrical connections with flex PCBs for improved operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If hardware changes are made to switch between operation modes, then different operation modes can be achieved, but device downtime increases and operation becomes more complex
Solution Approach 1:
The patent implements a movable stage that can dynamically reposition aperture arrays between different operational positions. This dynamic positioning mechanism allows the system to switch between operation modes (such as inspection mode and measurement mode) by moving the aperture array to different locations, eliminating the need for physical hardware changes and reducing device downtime while maintaining adaptability across multiple operation modes
2Adaptability or versatility
If hardware changes are made to switch between operation modes, then different operation modes can be achieved, but operation complexity increases and skilled personnel are required
Solution Approach 1:
The system incorporates automated control mechanisms that enable the movable stage and aperture arrays to be repositioned and configured through software control rather than manual hardware manipulation. This self-service capability allows operators to switch between operation modes through simplified interfaces, eliminating the need for skilled personnel to perform complex hardware changes and reducing operational complexity
3Manufacturing precision
If aperture arrays are changed to adjust beam parameters, then resolution and current values can be modified, but beam deflection and recalibration time increase
Solution Approach 1:
The patent pre-configures multiple aperture arrays with different aperture sizes and configurations at predetermined positions along the beam path. Before operation, these arrays are positioned and aligned in advance on the movable stage. When resolution or current adjustments are needed, the system simply moves to a pre-prepared aperture array configuration, eliminating the need for time-consuming recalibration and maintaining high manufacturing precision for beam parameters
Data Source
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AI summary
A charged particle beam device, comprising a charged particle source configured to emit a charged particle beam; a movable stage (320) comprising an assembly of aperture arrays (122, 126) having at least a first aperture array and a second aperture array, the movable stage is configured to align the assembly of aperture arrays with the charged particle beam, and at least one aperture array comprises a shielding tube (350) coupled to the movable stage.