Aperture Multipole Deposition for Electron Beam Aberration Correction
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Solution Overview
Problem
Conventional multipole devices in electron beam apparatuses are limited in generating complex beam correction fields, require multiple components, and have complex electrical connections, making them cumbersome and unsuitable for flexible adaptation to actual beam aberrations.
Innovation Solution
A method of forming a multipole device using electron beam-induced deposition to create a carbonaceous pattern on the aperture body of the electron beam apparatus, which acts as a multipole to correct beam aberrations without external power connections, allowing flexible adaptation to beam characteristics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional multipole devices with multiple electrodes and external power connections are used, then beam correction fields can be generated, but device complexity and space requirements increase
Solution Approach 1:
The multipole device uses the electron beam itself to charge the deposition pattern, eliminating the need for external power connections. The electron beam serves dual purposes: as the particle stream to be corrected and as the charging mechanism for the correction field,实现ing self-service operation
Solution Approach 2:
The patent replaces the mechanical/electrical system of external power connections and voltage supplies with a field-based system where the electron beam directly charges the deposition pattern through electromagnetic interaction, simplifying the overall device structure
2Reliability
If conventional multipole devices with fixed electrode arrangements are used, then stable beam correction can be achieved, but adaptability to different beam aberrations is limited
Solution Approach 1:
The deposition pattern can be dynamically adjusted by controlling the electron beam positioning and exposure duration, allowing the multipole device to adapt to different beam aberration conditions while maintaining stable operation during use
Solution Approach 2:
The deposition pattern is formed in advance by directing the electron beam onto specific surface portions of the aperture body, creating a pre-configured multipole field that can be tailored to correct specific beam aberrations before the actual beam correction process begins
3Reliability
If multiple separate multipole devices are used to correct complex beam aberrations, then comprehensive correction can be achieved, but space consumption and system complexity increase
Solution Approach 1:
The deposition pattern on the aperture body can serve multiple functions: it acts as both the aperture for beam passage and as the multipole electrode for beam correction, eliminating the need for separate components and reducing space requirements
Solution Approach 2:
The patent merges the aperture function and the multipole correction function into a single integrated structure where the deposition pattern on the aperture body surface performs both roles simultaneously, reducing the number of components needed
4Reliability
If high-order multipoles with many electrodes are used, then high-order beam aberrations can be corrected, but ease of manufacture and handling deteriorate
Solution Approach 1:
The patent replaces the complex mechanical fabrication of multiple precise electrodes with a simpler process of directing the electron beam to deposit material on the aperture surface, significantly easing manufacturing requirements while achieving high-order multipole fields
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a compact and easily adaptable multipole device that effectively corrects beam aberrations by utilizing existing hydrocarbons in the vacuum housing, reducing complexity and space requirements while maintaining high precision.
Implementation Method 1
directing the electron beam onto two or more surface portions of the aperture body on two or more sides of the at least one aperture opening for generating an electron beam-induced deposition pattern configured to act as a multipole
Implementation Method 2
The electrostatic field of the multipole device can influence the electron beam in a predetermined manner, e.g. for compensating or reducing beam aberrations
Data Source
AI summary
A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.