Charged Particle Aperture Venting for Contamination Control
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Solution Overview
Problem
Charged particle beam systems face contamination issues due to the accumulation of deposits on surfaces, particularly in areas with high hydrocarbon partial pressures and beam current densities, which affects the accuracy and reliability of the systems.
Innovation Solution
The system incorporates a charged particle optical element with a vent hole that provides a flow path for contaminant species, reducing pressure and preventing contamination growth, combined with a cleaning agent conduit to efficiently remove contamination from surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a plasma generator and guiding body are used to transport radicals for removal of contaminant deposits, then contamination removal capability is improved, but the rate of removal of deposits from surfaces is limited
Solution Approach 1:
The patent extracts the harmful contaminants from the system by introducing a cleaning agent that reacts with and removes deposits from the charged particle optical element surfaces. The cleaning agent is delivered through a dedicated conduit system that targets the optical elements directly, separating the cleaning function from the main beam path while effectively removing contaminants at a higher rate than previous plasma-based methods alone could achieve.
2Productivity
If cleaning agent is introduced towards charged particle optical element, then cleaning efficiency is improved, but contamination may still accumulate in areas with high hydrocarbon partial pressures
Solution Approach 1:
The patent applies local quality by delivering the cleaning agent through a conduit positioned to target specific charged particle optical elements that are most susceptible to contamination. The cleaning action is localized to the optical element surfaces where contamination occurs, while the vent hole provides localized pressure relief at the same location. This targeted approach ensures high cleaning efficiency at contamination-prone areas without requiring system-wide cleaning that would be less effective and more resource-intensive.
3Reliability
If vent hole with larger cross section is provided in charged particle optical element, then pressure reduction and contamination prevention are improved, but beam transmission may be affected
Solution Approach 1:
The patent segments the optical element structure by providing a separate vent hole pathway that is distinct from the beam transmission path. The vent hole is positioned and sized to provide pressure relief and contamination prevention functionality without interfering with the charged particle beam transmission through the optical element. This segmentation allows the optical element to simultaneously perform beam transmission and pressure equalization functions independently, maintaining beam accuracy while preventing contamination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces contamination in charged particle beam systems, enhances cleaning efficiency, and maintains the integrity of charged particle beam properties by preventing the growth of contamination layers on optical elements.
Implementation Method 1
providing a flow path from a first side to a second side of the charged particle optical element... reducing pressure on the first side of the charged particle optical element
Implementation Method 2
introducing a cleaning agent towards the charged particle optical element... efficiently remove contamination from surfaces
Implementation Method 3
The interaction between charged particle beams and contaminants may cause Electron Beam Induced Deposition (EBID) or Ion Beam Induced Deposition (IBID) on surfaces
Implementation Method 4
The interaction between charged particle beams and contaminants may cause Electron Beam Induced Deposition (EBID) or Ion Beam Induced Deposition (IBID) on surfaces
Data Source
AI summary
A charged particle beam system is disclosed, comprising:a charged particle beam generator for generating a beam of charged particles;a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;a source for providing a cleaning agent;a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;wherein the charged particle optical element comprises:a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, andat least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.