Application Management System for Version Update Metric Analysis

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

System administrators face challenges in identifying and reviewing threshold changes in performance metrics and providing feedback on the effects of frequent application version updates, as numerous metric types make it difficult to determine which metrics are affected by changes.

Innovation Solution

An application management system that monitors and analyzes measurement values of multiple metric types across different environments to identify differences between application versions, using a processor and storage device to determine affected metric types.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If numerous metric types are monitored to comprehensively track application performance, then measurement precision is improved, but device complexity increases making it difficult to determine which metrics are affected by version changes

Engineering Contradiction:
Improvecomprehensive metric monitoringVSAvoiddifficulty in determining affected metrics
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent extracts and identifies only the metric types that are actually affected by application version changes from the comprehensive set of monitored metrics. The analysis process filters out irrelevant metrics and focuses on extracting only those showing significant differences between versions, thereby reducing complexity while maintaining monitoring comprehensiveness.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent segments the monitoring process into distinct phases: collecting measurement values for multiple metric types, comparing metrics between different application versions, and identifying only the affected metric types. This segmentation allows comprehensive monitoring to be performed systematically without overwhelming complexity in determining which metrics matter.

Inventive Principle:
Principle #1Segmentation

2Productivity

If frequent application deployments are performed to improve adaptability, then productivity is improved, but device complexity increases as administrators must review more threshold changes

Engineering Contradiction:
Improvedeployment frequencyVSAvoidthreshold review burden
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent implements an automated feedback mechanism that compares metric measurement values between different application versions and automatically identifies threshold changes. This feedback loop eliminates the manual review burden by systematically generating reports on which metrics have changed and by how much, allowing frequent deployments without increasing administrative complexity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system performs self-service analysis by automatically comparing metrics across versions and identifying affected thresholds without requiring administrator intervention. The analysis process autonomously determines which metrics need attention based on predefined criteria, freeing administrators from manual threshold review while enabling frequent deployments.

Inventive Principle:
Principle #25Self-service

3Measurement precision

If comprehensive monitoring of multiple metric types is implemented to provide accurate feedback on version effects, then measurement precision is improved, but loss of time increases as administrators struggle to identify affected metrics

Engineering Contradiction:
Improvefeedback accuracy on version effectsVSAvoidtime to identify affected metrics
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent performs preliminary analysis by pre-establishing baseline metric values and thresholds for different application versions. The system proactively compares new version metrics against these pre-defined baselines, automatically identifying affected metrics before they become problematic. This preliminary preparation enables accurate feedback while minimizing the time administrators need to manually analyze metric changes.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS10949323B2Application management system, method, and computer program
Publication Date: 2021.03.16 HITACHI VANTARA LTD
  • US10949323B2 patent drawing
  • US10949323B2 patent drawing
  • US10949323B2 patent drawing

AI summary

A problem to be addressed by the present invention is that, when a version update of an application has been carried out, it has not been possible to ascertain which metrics are affected. Provided is an application management system, comprising: a monitoring program 1600, which measures a plurality of metric types in a plurality of different environments; a deployment program 1500 which deploys a first version and a second version of an application; and an analysis program which, on the basis of measurement values of the plurality of metric types in environments in which the first version and the second version of the application respectively operate, determine a metric type in which a difference occurs between the first version and the second version.