Applique Data Management Preventing Stitch Overlap
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Solution Overview
Problem
When sewing an applique piece with a hole, the stitches on the inner and outer contours can become too close or overlap, hiding the hole's perimeter and deteriorating the appearance, especially when the stitch width is increased.
Innovation Solution
An applique data management apparatus and sewing machine system that acquires sewing data, identifies the contours of the applique piece, and outputs an error notification if the inner and outer stitches are closer than a certain distance or overlapping, allowing users to correct the data and prevent aesthetic issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If the stitch width of the satin stitch is increased to improve visibility and coverage, then the stitching appearance is enhanced, but the inner stitch and outer stitch become too close or overlap, hiding the hole's perimeter and deteriorating the appearance
Solution Approach 1:
The system performs preliminary analysis of the sewing data to calculate the distance between inner and outer stitches before actual sewing occurs. By identifying potential overlap issues in advance, the system allows users to adjust stitch width or other parameters beforehand, preventing the hole perimeter from being hidden while still achieving adequate stitch visibility.
Solution Approach 2:
The system provides feedback to the user by displaying the calculated distance between inner and outer stitches and notifying when this distance is insufficient. This feedback mechanism enables users to make informed adjustments to sewing parameters, balancing stitch visibility with hole perimeter visibility through iterative refinement.
2Manufacturing precision
If the stitch width is increased to improve the stitching appearance, then the coverage and visibility are enhanced, but the inner contour stitch and outer contour stitch overlap, hiding the hole and deteriorating the appearance
Solution Approach 1:
The system calculates and analyzes the relationship between inner and outer stitches before sewing execution. By determining the distance between these stitches in advance, the system enables users to adjust parameters such as stitch width to ensure adequate coverage while preserving the hole's shape integrity.
Solution Approach 2:
The system provides quantitative feedback about the distance between inner and outer stitches, allowing users to understand the impact of parameter changes on both stitch coverage and hole shape preservation. This enables optimized parameter selection that achieves both goals simultaneously.
3Area of moving object
If the distance between inner contour and outer contour is reduced to create a compact design, then the applique piece becomes more compact, but the stitches become too close or overlap, deteriorating the appearance
Solution Approach 1:
The system performs preliminary calculation of stitch distances based on the compact applique design dimensions. By analyzing the resulting inner and outer stitch positions before sewing, the system identifies potential overlap issues and enables users to adjust parameters to maintain proper stitch arrangement while achieving compact dimensions.
Solution Approach 2:
The system provides feedback about the actual distance between inner and outer stitches resulting from the compact design, allowing users to evaluate whether the compact dimensions are achievable without stitch overlap. Users can iteratively adjust the design to find the optimal balance between compactness and stitch arrangement.
Data Source
AI summary
A controller acquires sewing data for sewing an applique piece on a sewing target material, the applique piece having a shape having a hole, the hole being a closed area surrounded by at least part of the applique piece, identifies a contour of the applique piece while distinguishing an inner contour and an outer contour, the inner contour being the contour defining the hole of the applique piece, the outer contour being the contour other than the inner contour, determines, based on the acquired sewing data, whether an inner stitch and an outer stitch are arranged at positions closer to each other than a particular distance or at positions overlapping each other, and outputs an error notification in response to determining that the inner stitch and the outer stitch are arranged at positions closer to each other than the particular distance or at positions overlapping each other.