Aqueous Inkjet Ink Composition for Stable Ejection and Abrasion Resistance
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Solution Overview
Problem
Conventional aqueous inkjet inks suffer from insufficient ejection performance and continuous ejection stability, leading to degradation in print quality such as streaks during continuous printing, despite improvements in abrasion resistance.
Innovation Solution
An aqueous inkjet ink formulation containing specific amounts of fine resin particles and a surfactant represented by formula (I) with a C1-C15 linear or branched substituent, including a hydroxy group or ether structure, enhances ejection performance and continuous ejection stability while providing abrasion resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If fine resin particles and silicone-based surfactant are used to improve abrasion resistance, then rubbing off reduction is achieved, but ejection performance and continuous ejection stability deteriorate
Solution Approach 1:
The patent changes the chemical structure parameters of the surfactant from conventional silicone-based types to specific compounds with hydroxy groups or ether structures at one end and fluorine or silicone groups at the other end. This structural parameter change allows the surfactant to provide both abrasion resistance and good ejection performance by modifying how it interacts with pigment particles and the ejection system.
Solution Approach 2:
The patent uses a composite surfactant system combining organic and inorganic components (hydroxy/ether groups with fluorine or silicone groups). This composite structure allows the surfactant to simultaneously provide dispersion, ejection performance, and abrasion resistance that single-component surfactants cannot achieve alone.
2Strength
If fine resin particles are increased to improve abrasion resistance, then coating durability is enhanced, but ejection performance and print quality deteriorate
Solution Approach 1:
The patent optimizes the concentration parameter of fine resin particles to a specific range (0.01-5% by mass). This parameter optimization ensures sufficient abrasion resistance while preventing excessive viscosity and poor ejection performance that would result from higher concentrations.
Solution Approach 2:
The patent introduces a specific type of surfactant as an intermediary substance that mediates between the fine resin particles and the ejection system. This surfactant reduces particle aggregation and improves flow characteristics, allowing higher fine resin content for abrasion resistance without sacrificing ejection performance or print quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The ink achieves excellent ejection performance, continuous ejection stability, and abrasion resistance, with improved storage stability and refillability.
Implementation Method 1
a surfactant which comprises a hydroxy group or an ether structure at one end and a fluorine group or a silicone group at the other end
Implementation Method 2
use of specific fine resin particles and a silicone-based surfactant reduces or prevents rubbing off of the ink coating (fading) due to friction (abrasion resistance)
Data Source
AI summary
The present invention aims to provide an aqueous inkjet ink The present invention can provide an aqueous inkjet ink excellent in ejection performance and continuous ejection stability and capable of forming a coating excellent in abrasion resistance. The present invention relates to an aqueous inkjet ink containing: a pigment; fine resin particles; a surfactant; and water, the fine resin particles being contained in an amount of 0.5 to 10% by mass in solid content based on a total mass of the aqueous inkjet ink, the aqueous inkjet ink containing, as the surfactant, a surfactant represented by the following formula (I) in an amount of 0.01 to 1% by mass based on the total mass of the aqueous inkjet ink: wherein R1 is a C1-C15 linear or branched substituent containing at least one of a hydroxy group or an ether structure.