Adjustable Arc Chamber Support for Ion Source Slit Alignment

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Solution Overview

Problem

Ion beam quality is compromised due to misalignment of the exit slit of the arc chamber with the extraction electrode, often caused by warpage of the base plate resulting from inadequate cooling system design, leading to reduced throughput in ion implantation processes.

Innovation Solution

The use of adjustable arc support plates that allow for the adjustment of both altitude and angle of the arc chamber, incorporating through-holes and screws to align the exit slit with the extraction electrode, ensuring precise alignment and improved beam quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a fixed base plate is used to support the arc chamber, then the structure is simple and stable, but warpage occurs due to inadequate cooling leading to misalignment of the exit slit with the extraction electrode

Engineering Contradiction:
Improvealignment precisionVSAvoidsupport structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent transforms the fixed base plate into an adjustable support system with multiple height positions and angular adjustments. The arc chamber support structure includes adjustable support means that can be positioned at different heights and angles, allowing dynamic adaptation to compensate for base plate warpage and maintain proper alignment between the exit slit and extraction electrode.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent changes the geometric parameters of the support structure by providing multiple adjustable height positions and angular orientations. This allows the arc chamber to be repositioned in three-dimensional space, changing its spatial parameters to achieve proper alignment despite base plate deformation.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the arc chamber position is fixed, then the device operation is simple, but misalignment reduces ion beam quality and throughput

Engineering Contradiction:
Improveion beam throughputVSAvoidalignment adjustment complexity
Core Design Contradiction:
ProductivityVSEase of operation

Solution Approach 1:

The patent implements preliminary alignment adjustments during the setup phase, allowing the arc chamber to be properly positioned before operation. The adjustable support structure enables pre-alignment of the exit slit with the extraction electrode, ensuring optimal ion beam quality and throughput from the start of operation.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent replaces manual alignment procedures with a mechanical adjustment system that provides predefined height positions and angular orientations. This mechanical substitution makes alignment more systematic and less dependent on operator skill, improving both ease of operation and alignment precision.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If the base plate cooling system is inadequate, then the device structure remains simple, but thermal warpage causes misalignment and reduces beam quality

Engineering Contradiction:
Improveslit alignment precisionVSAvoidbase plate temperature stability
Core Design Contradiction:
Manufacturing precisionVSTemperature

Solution Approach 1:

The patent introduces an intermediary adjustable support structure between the base plate and the arc chamber. This intermediary component decouples the arc chamber alignment from the base plate temperature stability, allowing the arc chamber to maintain proper alignment even when the base plate experiences thermal warpage due to inadequate cooling.

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS20250323004A1Adjustable support for arc chamber of ion source
Publication Date: 2025.10.16 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20250323004A1 patent drawing
  • US20250323004A1 patent drawing
  • US20250323004A1 patent drawing

AI summary

An assembly present in an ion source for supporting an arc chamber upon a base plate includes a first arc support plate, a first screw, and a second screw. The first screw passes through a smooth through-hole in an arm of the first arc support plate and extends into a bore in the base plate. The second (or adjustable) screw passes through a threaded through-hole in an arm of the first arc support plate and engages an upper surface of the base plate itself, and can be used to change the altitude and angle of the first arc support plate relative to the base plate. This adjustment ability improves the beam quality of the ion source.