Arc Evaporation Source with Ring Magnet for Uniform Magnetic Field
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Solution Overview
Problem
Existing arc evaporation sources struggle to generate magnetic force lines with high straightness across the entire surface of the target, leading to uneven wear and reduced film deposition speed.
Innovation Solution
The implementation of a ring-shaped magnetic field guide magnet and a back side magnetic field generation source, with specific magnetization directions and arrangements, to create parallel and perpendicular magnetic force lines that extend from the target's surface to the substrate, ensuring uniform magnetic field distribution and reducing target wear.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If two disk-shaped magnets are arranged at an interval at a back side of the target to generate magnetic force lines, then the straightness of magnetic force lines can be improved at the center portion, but magnetic force lines emitted from the outer periphery side diverge outward
Solution Approach 1:
The invention divides the single magnet system into multiple magnets (first and second magnets) arranged at different positions and orientations. The first magnet is arranged with its magnetization direction substantially perpendicular to the target surface, while the second magnet is arranged with its magnetization direction substantially parallel to the target surface. This segmentation allows each magnet to contribute to different regions of the magnetic field, extending the area of high straightness magnetic force lines from just the center portion to cover the entire target surface including outer periphery regions.
Solution Approach 2:
The invention applies different magnetization directions to different magnets to create locally optimized magnetic field characteristics. The first magnet provides perpendicular magnetic force lines for the center region, while the second magnet provides parallel magnetic force lines for the outer periphery region. This local quality approach ensures that each region of the target surface receives the appropriate magnetic field orientation for optimal ionized substance induction.
2Object-generated harmful factors
If the arc spot moves at high speed to reduce macroparticles, then the amount of macroparticles is reduced, but the moving speed of the arc spot is affected by the magnetic field applied to the target surface
Solution Approach 1:
The invention changes the magnetic field parameters by using multiple magnets with different magnetization directions (perpendicular and parallel to the target surface) instead of a single magnet configuration. This parameter change creates a more uniform and controllable magnetic field distribution across the target surface, which stabilizes arc spot movement and reduces macroparticle generation without requiring overly complex magnetic field control mechanisms.
3Productivity
If magnetic force lines are generated in a direction from the surface of the target toward the substrate, then ionized target substance can be induced in the substrate direction, but magnetic force lines from the outer periphery diverge outward reducing efficiency
Solution Approach 1:
The invention segments the magnetic field generation into two components: the first magnet generating perpendicular magnetic force lines for efficient ionized substance induction toward the substrate, and the second magnet generating parallel magnetic force lines to maintain uniform distribution across the entire target surface including outer periphery regions. This segmentation resolves the contradiction by ensuring both efficient substrate-directed ion transport and uniform magnetic field coverage.
Solution Approach 2:
The invention creates a composite magnetic field structure by combining the effects of two magnets with different magnetization directions. This composite approach produces a unified magnetic field distribution that maintains high straightness and substrate directionality across the entire target surface, enabling uniform film deposition with high productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for the generation of magnetic force lines with high straightness across a wide region of the target surface, stabilizing the arc discharge and increasing film deposition speed while minimizing target wear.
Implementation Method 1
a ring-shaped magnetic field guide magnet (3) and a back side magnetic field generation source (4)... forms magnetic force lines along the magnetization direction of the magnetic field guide magnet (3)
Implementation Method 2
arc discharge is generated on a surface of a target being a cathode, and hence a substance forming the target is instantly molten, evaporated, and ionized
Implementation Method 3
a substance forming the target is instantly molten, evaporated, and ionized
Implementation Method 4
a physical vapor deposition method of coating a surface of a substrate, which is the part or tool, with a thin film
Data Source
Figure 1(a)~1(b)
Figure 2(a)~2(b)
Figure 3~4
AI summary
Provided is an arc evaporation source equipped with a target, a ring-shaped magnetic field guide magnet and a back side magnetic field generation source. The magnetic field guide magnet is aligned in a direction perpendicular to the evaporation face of the target and has a polarity that is the magnetization direction facing forward or backward. The back side magnetic field generation source is disposed at the rear of the magnetic field guide magnet, which is at the side of the back side of the target, and forms magnetic force lines running in the direction of magnetization of the magnetic field guide magnet. The target is disposed such that the evaporation face is positioned in front of the magnetic field guide magnet.