Aromatic Polymer Hardmask for Antireflective Etch Masking
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Solution Overview
Problem
The microelectronics industry faces challenges in reducing the size of microelectronic devices, requiring improved hardmask compositions that can be applied without high-temperature baking, offer antireflective properties, and provide high etch selectivity and resistance to multiple etching steps, while minimizing contamination and interactions with imaging resist layers, especially at shorter wavelengths.
Innovation Solution
A polymer composition incorporating aromatic ring-containing polymers with specific molecular structures and weight ratios, combined with organic solvents, crosslinking components, and acid catalysts, which can be applied via spin-coating and exhibit self-crosslinking properties to form a hardmask layer with antireflective properties and high etch selectivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional hardmask materials are used, then etch resistance is achieved, but application requires high-temperature baking and complex deposition processes
Solution Approach 1:
The patent changes the chemical composition parameters of the hardmask material by incorporating aromatic ring-containing polymers with specific functional groups (carboxyl, hydroxyl, amino, or dialkylamino groups). This compositional change enables the material to achieve both ease of spin-coating application and sufficient etch resistance without requiring high-temperature baking processes
Solution Approach 2:
The patent creates a composite hardmask material system combining aromatic ring-containing polymers with specific functional groups. This composite structure provides multiple benefits: the aromatic rings contribute to etch resistance, while the functional groups enable chemical interactions that enhance adhesion and allow lower temperature processing, eliminating the need for complex high-temperature baking
2Object-affected harmful factors
If additional antireflective coating is applied, then reflectivity is reduced, but process complexity and number of layers increase
Solution Approach 1:
The patent merges the functions of the hardmask layer and antireflective coating into a single integrated layer. The aromatic ring-containing polymer structure inherently provides both etch mask functionality and antireflective properties through its optical characteristics, eliminating the need for a separate antireflective coating layer and reducing overall process complexity
Solution Approach 2:
The hardmask composition achieves multi-functionality by simultaneously providing etch resistance, pattern definition, and antireflective properties. The aromatic ring structure absorbs imaging radiation to prevent reflections, while the polymer matrix provides etch resistance, making a single layer perform multiple functions that traditionally required separate layers
3Stability of the object's composition
If high-temperature baking is used, then coating stability is improved, but storage stability and material degradation are worsened
Solution Approach 1:
The patent changes the processing temperature parameter from high-temperature baking to lower temperature treatment. The aromatic ring-containing polymer with functional groups achieves sufficient crosslinking and adhesion at lower temperatures, preventing material degradation and maintaining storage stability while still providing coating stability through the chemical structure and crosslinking reactions
4Manufacturing precision
If conventional hardmask materials are used, then etch selectivity is achieved, but contamination from particles and acid pollution occurs
Solution Approach 1:
The patent changes the chemical composition parameters to use aromatic ring-containing polymers with specific functional groups that provide etch selectivity through chemical resistance mechanisms. These materials achieve the required etch selectivity without generating acid pollution or particle contamination, as the polymer structure itself provides the necessary resistance properties without requiring additional etching steps or generating harmful byproducts
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer composition enables effective pattern transfer with reduced reflectivity, high etch selectivity, and resistance to multiple etching steps, eliminating the need for additional antireflective coatings and allowing for the use of lower baking temperatures, thereby enhancing storage stability and coating properties.
Implementation Method 1
an aromatic ring-containing polymer with a strong absorption in the short wavelength region (e.g., 157 nm, 193 nm and 248 nm)
Implementation Method 2
exhibit self-crosslinking properties to form a hardmask layer
Data Source
AI summary
A polymer composition includes an aromatic ring-containing polymer represented by Formula 1:wherein m and n satisfy the relations 1≦m<190, 0≦n<190, and 1≦m+n<190.