Low Molecular Weight Aromatic Resist for Fine Patterning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional polymer-based resist materials face challenges in forming fine patterns due to roughness and molecular weight issues, leading to decreased yield and heat resistance, while low molecular weight resist materials suffer from poor heat resistance, solubility, and pattern quality.
Innovation Solution
A resist composition containing a specific compound with a highly aromatic skeleton, represented by a particular chemical formula, which enhances heat resistance, solubility, and pattern sensitivity, allowing for the formation of finer patterns with improved shape and resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If polymer based resist materials are used, then the resist film can be formed, but the molecular weight is large (10,000 to 100,000) causing roughness on fine pattern surface and difficulty in controlling pattern dimension
Solution Approach 1:
The patent changes the molecular weight parameter from polymer range (10,000-100,000) to low molecular weight range (100-10,000), and modifies the chemical structure parameters by introducing specific aromatic rings and hydroxyl groups to achieve both fine pattern formation and adequate film properties
Solution Approach 2:
The patent creates a composite molecular structure combining aromatic rings (for heat resistance), hydroxyl groups (for solubility and crosslinking), and specific side chains (for solubility control), achieving multiple performance requirements simultaneously
2Manufacturing precision
If low molecular weight resist materials are used, then finer patterns can be formed, but heat resistance becomes insufficient and pattern shape deteriorates
Solution Approach 1:
The patent introduces aromatic rings (naphthalene, anthracene, phenanthrene structures) into the low molecular weight resist material to increase heat resistance while maintaining low molecular weight, and optimizes hydroxyl group content to balance solubility and thermal stability
Solution Approach 2:
The patent creates a composite structure with multiple aromatic rings combined with hydroxyl groups and side chains, achieving a synergistic effect where aromatic rings provide heat resistance, hydroxyl groups provide solubility and crosslinking capability, and the overall structure maintains low molecular weight for fine patterning
3Temperature
If low molecular weight cyclic polyphenolic compounds are used, then heat resistance improves, but solubility in safe solvents decreases and sensitivity becomes low
Solution Approach 1:
The patent modifies the solubility parameters by introducing specific side chains (alkyl, alkoxy, halogen groups) that enhance solvent interaction, and optimizes the ratio of aromatic rings to hydroxyl groups to balance heat resistance and solubility
Solution Approach 2:
The patent creates a composite molecular structure combining heat-resistant aromatic cores with solubility-enhancing side chains and crosslinking-capable hydroxyl groups, achieving simultaneous improvement in heat resistance, solubility, and sensitivity
4Manufacturing precision
If conventional low molecular weight resist materials are used, then sensitivity can be improved, but the shape of resulting resist pattern becomes poor
Solution Approach 1:
The patent optimizes the molecular structure parameters by controlling molecular weight distribution (narrower than polymers), aromatic ring content, and hydroxyl group positioning to achieve both high sensitivity and excellent pattern shape with vertical sidewalls
Solution Approach 2:
The patent creates a composite structure where the aromatic core provides sensitivity and heat resistance, hydroxyl groups enable crosslinking for shape control, and side chains regulate solubility, achieving simultaneous optimization of sensitivity and pattern shape
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves excellent heat resistance, high solubility in safe solvents, and high sensitivity, enabling the formation of precise resist patterns with reduced line edge roughness and improved processing stability.
Implementation Method 1
a resist composition comprising a compound represented by the following formula (1)... an acid generating agent... an acid crosslinking agent
Data Source
AI summary
The resist composition according to the present invention contains a compound represented by a specific formula. The compound has high heat resistance attributed to its highly aromatic skeleton, in spite of its low molecular weight, and may be used even under high temperature baking conditions. By virtue of the above configuration, the resist composition according to the present invention is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. That is, the resist composition according to the present invention is useful as an acid amplification type non-polymer based resist material.