Antireflective Coating with Fused Aromatic Rings for EUV Lithography
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Solution Overview
Problem
In microlithography, existing antireflective coatings fail to adequately address back reflection issues from highly reflective substrates, leading to thin film interference and reflective notching, which distort image uniformity and cause line width variations, especially in extreme ultraviolet (EUV) lithography processes.
Innovation Solution
A novel organic spin coatable antireflective coating composition comprising a polymer with 3 or more fused aromatic rings and an aliphatic moiety, which self-crosslinks or crosslinks with additives, providing high carbon content and etch resistance, reducing reflections and enhancing pattern transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If conventional antireflective coatings are used, then back reflection is reduced, but thin film interference and reflective notching still occur causing image distortion and line width variations
Solution Approach 1:
The patent changes the chemical composition parameters of the antireflective coating by incorporating polymers with 3 or more fused aromatic rings in the backbone. This structural modification increases carbon content and alters optical properties, enabling the coating to reduce reflections more effectively while maintaining image uniformity and preventing line width variations in EUV lithography processes.
Solution Approach 2:
The invention creates a composite antireflective coating system by combining polymers with fused aromatic rings and aliphatic moieties. This composite structure provides both high carbon content for reflection reduction and controlled etch resistance, resolving the contradiction between reflection control and image precision.
2Strength
If the antireflective coating has high carbon content for etch resistance, then pattern transfer is enhanced, but intermixing with photoresist may increase
Solution Approach 1:
The patent applies local quality by designing the polymer with distinct regions: fused aromatic rings providing high carbon content and etch resistance in specific segments, while aliphatic moieties provide compatibility and reduce intermixing at the interface with photoresist. This localized functional distribution resolves the contradiction between etch resistance and interface stability.
3Measurement precision
If existing photoresist systems are used for miniaturization, then resolution is improved, but sophisticated multilevel systems are required increasing process complexity
Solution Approach 1:
The antireflective coating with fused aromatic ring polymers serves multiple functions simultaneously: it provides reflection control, enhances etch resistance for better pattern transfer, and maintains interface stability. This multi-functionality reduces the need for additional specialized layers, simplifying the overall lithographic process while maintaining high resolution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high resolution image transfer with high aspect ratio and minimal intermixing, improving lithographic performance by reducing reflections and maintaining film quality, even under extreme UV exposure.
Implementation Method 1
The present invention relates to an absorbing antireflective coating composition comprising a polymer with 3 or more fused aromatic rings in the backbone of the polymer
Implementation Method 2
The antireflective coating is cured to prevent intermixing between the antireflective coating and the photoresist
Data Source
AI summary
The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.