Aromatic Sulfonium Salt Compounds for Photoresist Solubility
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Solution Overview
Problem
Existing aromatic sulfonium salt compounds have insufficient solubility, making them challenging for micropatterning as negatively working resist materials due to poor developing properties.
Innovation Solution
Aromatic sulfonium salt compounds with a specific structure, represented by general formula (I), are developed, featuring substituents such as hydroxyl groups and hydroxyl-substituted thioalkoxy groups, which enhance solubility and acid-generating capabilities, leading to improved developing and curing properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional aromatic sulfonium salt compounds are used, then acid generation capability is achieved, but solubility is insufficient and developing properties are poor
Solution Approach 1:
The patent modifies the molecular structure parameters of aromatic sulfonium salt compounds by introducing specific substituents (hydroxyl groups at positions 3 and 5, and thioalkoxy groups) to change the solubility characteristics while maintaining acid generation capability. This structural parameter change resolves the contradiction between sufficient solubility and developing properties.
Solution Approach 2:
The invention creates a composite molecular structure combining aromatic sulfonium salt core with multiple functional groups (hydroxyl and thioalkoxy substituents) to achieve both good solubility in resist matrices and high developing properties, resolving the contradiction through molecular composite design.
2Manufacturing precision
If conventional aromatic sulfonium salt compounds are used, then acid generation function is provided, but micropatterning resolution is insufficient
Solution Approach 1:
By changing the molecular parameters through specific substituent introduction (hydroxyl at positions 3 and 5, thioalkoxy groups), the patent achieves both high developing properties and excellent micropatterning resolution, simultaneously improving manufacturing precision and reliability.
3Ease of manufacture
If aromatic sulfonium salt compounds with enhanced solubility are designed, then developing properties improve, but acid generation capability may be reduced
Solution Approach 1:
The patent applies local quality modification by introducing specific functional groups (hydroxyl and thioalkoxy) at specific positions (3 and 5) on the aromatic rings, which locally enhance solubility without affecting the core sulfonium salt's acid generation capability, thus resolving the contradiction between solubility and acid generation.
Solution Approach 2:
Through controlled parameter changes in molecular structure (adding specific substituents at defined positions), the invention achieves enhanced solubility while preserving the acid generation function of the sulfonium salt core, simultaneously improving both ease of manufacture and reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new aromatic sulfonium salt compounds exhibit high sensitivity and resolution in photoresist compositions, suitable for semiconductor fabrication and cationic polymerization, offering superior micropatterning and curing performance.
Implementation Method 1
A sulfonium salt compound is a substance that generates an acid on exposure to energy radiation, such as light
Data Source
AI summary
The invention provides a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Specifically, the invention provides an aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R19 are each hydrogen, halogen, hydroxyl, optionally hydroxyl-substituted C1-C18 alkyl, optionally hydroxyl-substituted C1-C18 alkoxy, optionally hydroxyl-substituted C1-C18 thioalkoxy, etc.; An- is a monovalent anion; at least one of R1 to R19 is a substituent selected from the group consisting of hydroxyl, hydroxyl-substituted C1-C12 ester group, hydroxyl-substituted C1-C18 alkoxy, and hydroxyl-substituted C1-C18 thioalkoxy.