Array Substrate Recess Layout for Uniform Display Brightness
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Solution Overview
Problem
Existing display panels suffer from uneven brightness due to excessive residues of the conductive enhancement layer in the edge areas, leading to low transmittance and brightness in the display region.
Innovation Solution
The array substrate design includes a recessed portion in the transition region to control the flow of the mask layer, ensuring uniform thickness and consistent brightness across the display region by reducing the mask layer residue in the edge areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the conductive enhancement layer is formed in the edge areas, then the resistance is reduced, but excessive residues are generated leading to uneven brightness
Solution Approach 1:
The patent divides the substrate into different regions (display region and transition region) with different structural configurations. The transition region includes a recessed portion that is shallower than via holes in the display region, creating segmented depth levels that control mask layer flow and conductive enhancement layer residue distribution.
Solution Approach 2:
The patent applies different structural characteristics to different regions: the display region has deep via holes for complete conductive enhancement layer removal, while the transition region has shallower recessed portions that allow controlled residue retention, optimizing both electrical conductivity and brightness uniformity locally.
2Ease of manufacture
If the mask layer flows from peripheral regions to display region, then the conductive enhancement layer is formed, but excessive mask layer residues remain in edge areas reducing transmittance
Solution Approach 1:
The patent pre-forms via holes in the display region and recessed portions in the transition region before mask layer deposition. This preliminary structuring guides the mask layer flow path and controls its distribution, preventing excessive residue accumulation in edge areas while ensuring adequate coverage for conductive enhancement layer formation.
Solution Approach 2:
The patent introduces a depth dimension variation through the recessed portions in the transition region, creating a three-dimensional structure that controls mask layer flow from the peripheral regions. The shallower recessed portions act as flow control zones, directing mask layer material toward the display region while preventing excessive accumulation at edges.
3Reliability
If via holes are provided in the transition region, then the conductive enhancement layer is enhanced, but the structure becomes more complex
Solution Approach 1:
The patent merges the via hole structure with the recessed portion structure in the transition region. The recessed portions are formed at the same location as via holes, combining two structural features into one integrated element that serves dual purposes: guiding mask layer flow and providing conductive enhancement pathways.
Solution Approach 2:
The recessed portions in the transition region serve multiple functions: they act as flow control zones for the mask layer, provide structural support for the conductive enhancement layer, and enable electrical connectivity without requiring separate complex structures for each function.
Data Source
AI summary
An array substrate has a display zone and a transition zone located on at least one side of the display zone. The array substrate includes a first base substrate, an insulating layer group, a first electrode layer and a conductive enhancement layer, wherein the insulating layer group is arranged on one side of the first base substrate, the insulating layer group is provided with a recess, and the recess is located in the transition zone; the first electrode layer is arranged on the side of the insulating layer group away from the first base substrate; and the conductive enhancement layer is arranged on the side of the first electrode layer away from the first base substrate, and the orthographic projection of the conductive enhancement layer on the first base substrate is located within the orthographic projection of the first electrode layer on the first base substrate.