Array Substrate Color Filter Integration for Aperture Ratio
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Solution Overview
Problem
The deviation between array substrates and color filter substrates during the cell-assembly process in LCD manufacturing leads to reduced aperture opening ratio, increased energy consumption, and decreased brightness and color gamut, especially in high PPI displays, and existing solutions like COA technology require additional processes and materials.
Innovation Solution
An array substrate with a CF layer that includes filter patterns of different colors, where at least two kinds of filter patterns are superimposed at positions corresponding to gate lines, data lines, and TFTs, providing a light-shielding effect without the need for additional black matrixes, thus simplifying the manufacturing process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional cell-assembly process with separate array substrate and CF substrate is used, then manufacturing process is established, but deviation between substrates reduces aperture opening ratio and display quality
Solution Approach 1:
The patent merges the CF layer formation process into the array substrate manufacturing process. The color filter patterns are formed directly on the array substrate during the same manufacturing steps, eliminating the need for a separate CF substrate and subsequent bonding process. This integration ensures perfect alignment between the array substrate and CF patterns, completely eliminating deviation issues and maximizing aperture opening ratio.
2Area of stationary object
If COA technology is used to form CFs on array substrate, then aperture opening ratio improves, but additional processes and materials are required
Solution Approach 1:
The patent combines the CF layer formation with the existing array substrate manufacturing process. The same photomask patterns and deposition steps used for forming pixel electrodes and conductive layers are also used to form the color filter patterns. This merging eliminates additional manufacturing processes and materials, achieving both high aperture opening ratio and process simplicity.
Solution Approach 2:
The patent makes the photomask and deposition processes universal, serving dual purposes: forming both the electrical components (pixel electrodes, conductive layers) and the optical components (color filter patterns). This multi-functionality eliminates the need for separate dedicated processes for CF layer formation, reducing manufacturing complexity while maintaining high aperture opening ratio.
3Object-affected harmful factors
If black matrixes are added to shield light, then light shielding improves, but manufacturing process and costs increase
Solution Approach 1:
The patent merges the light-shielding function into the color filter patterns themselves. The CF patterns are designed to extend into the pixel electrode regions, and their inherent light-absorbing properties provide the necessary light shielding. This eliminates the need for separate black matrix structures, maintaining effective light shielding while simplifying the manufacturing process and reducing costs.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances light shielding, improves aperture opening ratio, reduces energy consumption, and maintains high display quality without the need for additional black matrixes, thereby lowering production costs and simplifying the manufacturing process.
Implementation Method 1
filter patterns of each color include a plurality of filter units... at least two kinds of filter patterns of different colors are provided with mutually superimposed parts at positions corresponding to the plurality of gate lines, the plurality of data lines and the plurality of TFTs, and the superimposed parts are configured to separate the filter units
Data Source
Figure 1a
Figure 1b
Figure 2~3
AI summary
An array substrate, a preparation method therefor, a display panel, and a display device. A color film layer (118) of the array substrate comprises filtering patterns (110, 111, 112) of multiple different colors. The filtering pattern of each color comprises multiple filtering units (121). The filtering patterns of at least two different colors are provided with overlapped portions (122) at the positions corresponding to multiple gate lines (102), multiple data lines (107) and multiple thin-film transistors (117). The overlapped portions (122) are used for partitioning the filtering units (121). One of the filtering patterns of at least two different colors and having the overlapped portions at the positions corresponding to the multiple gate lines (102) and the multiple thin-film transistors (117) is the filtering pattern with the lowest light transmittance in the filtering patterns of the multiple different colors. A black matrix does not need to be prepared for the display panel comprising the array substrate.