Array Substrate Common Electrode Transmittance via Reduction Resistant Layer

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Solution Overview

Problem

The existing array substrate structures for touch screen panels suffer from reduced light transmittance due to the reductive atmosphere generated during the deposition of the second insulation layer, which affects the film quality and displaying performance of the common electrode.

Innovation Solution

A reduction resistant layer composed of composition-variable SiNxOy is deposited on the common electrode before the second insulation layer, using PECVD to form a gradual composition change from SiO2 to SiNx, preventing film quality degradation and enhancing transmittance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the second insulation layer is deposited directly on the common electrode using PECVD, then the insulation layer can be formed, but the reductive atmosphere causes reduction of the common electrode surface layer, degrading film quality and reducing light transmittance

Engineering Contradiction:
Improvefilm quality of common electrodeVSAvoidlight transmittance of common electrode
Core Design Contradiction:
ReliabilityVSIllumination intensity

Solution Approach 1:

A protection layer is formed on the common electrode before depositing the second insulation layer. This preliminary protective measure prevents the common electrode from direct exposure to the reductive atmosphere during subsequent PECVD processing, thereby maintaining both film quality and light transmittance

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The protection layer acts as an intermediary barrier between the common electrode and the reductive atmosphere generated during PECVD. This intermediate layer prevents harmful chemical interactions while allowing the insulation layer to be deposited, thus preserving the optical and electrical properties of the common electrode

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If PECVD is used to deposit the second insulation layer, then the insulation layer can be formed with good quality, but the reductive atmosphere generated during deposition degrades the common electrode

Engineering Contradiction:
Improvequality of insulation layerVSAvoidreductive atmosphere effect on common electrode
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The deposition process is segmented into distinct stages: first forming a protection layer on the common electrode, then depositing the second insulation layer. This segmentation isolates the common electrode from harmful reductive effects while maintaining the benefits of PECVD for insulation layer quality

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The protection layer is formed as a preliminary step before the main insulation layer deposition. This preliminary action prepares the substrate by creating a barrier that prevents the reductive atmosphere from affecting the common electrode during the subsequent insulation layer formation

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively increases the transmittance of the common electrode by protecting it from the reductive atmosphere during insulation layer deposition, thereby enhancing the displaying performance of the touch screen panel.

Implementation Method 1

A reduction resistant layer composed of composition-variable SiNxOy is deposited on the common electrode before the second insulation layer, using PECVD to form a gradual composition change from SiO2 to SiNx

Methodology Applied
Scientific EffectPlasma enhanced chemical vapor deposition: Plasma Enhanced Chemical Vapour Deposition

Data Source

PatentUS9971214B2Array substrate structure and manufacturing method thereof
Publication Date: 2018.05.15 TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD
  • US9971214B2 patent drawing
  • US9971214B2 patent drawing
  • US9971214B2 patent drawing

AI summary

A manufacturing method of an array substrate structure is disclosed, in which after a common electrode is formed, a reduction resistant layer is first formed on the common electrode before deposition of a second insulation layer in order to prevent the film quality of the common electrode from being affected by a reductive atmosphere generated in a process of directly depositing the second insulation layer on the common electrode thereby reducing the influence on the transmittal of the common electrode caused by the deposition of the second insulation layer on the common electrode and providing the common electrode with increased transmittal and enhancing displaying performance.