Array Substrate Electrode Width Compensation for Etching Deviations
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Solution Overview
Problem
The existing patterning processes for creating slit and elongated strip electrodes in Advanced Super Dimension Switching (ADS) LCDs are prone to over etching or inadequate etching due to unstable light exposure, developing conditions, and etching liquid concentration variations, leading to deviations from the standard width of 4 μm, which affects light transmittance and visual quality.
Innovation Solution
The array substrate and mask plate designs feature electrode patterns and light-blocking/light-transmitting portions with preset widths that differ from standard widths, ensuring that the widths of the transparent electrode films and slits remain approximately at the desired standard after etching, thereby reducing over or inadequate etching and maintaining optimal visual effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a standard patterning process is used to create electrode patterns, then the manufacturing process is simple, but the etching width deviates from the standard 4 μm due to unstable exposure, developing, and etching conditions
Solution Approach 1:
The patent applies preliminary action by pre-compensating for etching width deviations in the mask plate design. The mask plate is designed with specific width adjustments (e.g., wider light-blocking portions or narrower light-transmitting portions) before the patterning process, so that after etching, the final electrode patterns achieve the desired standard width. This anticipates and corrects for unstable etching conditions before they cause defects.
Solution Approach 2:
The patent changes the geometric parameters of the mask plate patterns to compensate for process variations. By adjusting the width parameters of light-blocking and light-transmitting portions in the mask plate, the final etched electrode patterns achieve consistent standard widths despite variations in exposure, developing, and etching conditions.
2Manufacturing precision
If the etching conditions are strictly controlled to maintain precise width, then the manufacturing precision improves, but the manufacturing complexity and cost increase
Solution Approach 1:
The mask plate is designed in advance with pre-calculated width compensations that account for typical etching variations. This preliminary design adjustment eliminates the need for strict real-time control of etching conditions, making the manufacturing process easier while maintaining precision.
Solution Approach 2:
The patent converts the harmful effect of unstable etching conditions into a benefit by designing the mask plate to anticipate and compensate for these variations. The inherent process variations are transformed into predictable outcomes through the pre-designed compensation, simplifying manufacturing control.
3Manufacturing precision
If the mask plate design is adjusted to compensate for etching variations, then the electrode width precision improves, but the mask plate design complexity increases
Solution Approach 1:
The patent changes the geometric parameters of the mask plate patterns (widths of light-blocking and light-transmitting portions) to achieve precise final electrode widths. While the mask plate design becomes slightly more complex, this is a one-time design adjustment that simplifies subsequent manufacturing processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design ensures that the widths of the transparent electrode films are maintained at the standard width after etching, significantly reducing over or inadequate etching issues and minimizing their impact on visual quality and light transmittance.
Implementation Method 1
a portion of the photoresist is irradiated and denaturized
Data Source
AI summary
Embodiments of the disclosed technology provide an array substrate. The array substrate comprises: a plurality of electrode patterns with a predetermined shape being subsequently arranged in a predetermined direction, every two adjacent electrode patterns having a slit therebetween; a preset width of all or a part of the plurality of electrode patterns in the predetermined direction is different from a standard width of electrode pattern. The embodiments of the invention further provide a mask plate.