Array Substrate Functional Layer Protects Active Layer
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Solution Overview
Problem
Current display panels damage the active layer during preparation, leading to decreased performance of IGZO thin film transistors due to oxygen vacancy defects and etching effects from photoresist stripping solutions.
Innovation Solution
An array substrate design with a functional layer positioned between the active layer and the gate insulating layer, featuring a through-hole connection for the source/drain layer, which protects the active layer from damage and ensures proper conductivity, using materials like indium gallium zinc oxide and metal oxides for enhanced performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If photoresist stripping solution is used during preparation, then the preparation process can be completed, but the active layer is damaged due to etching effects
Solution Approach 1:
The patent introduces a protective layer as an intermediary between the photoresist stripping solution and the active layer. This protective layer allows the stripping solution to perform its function while preventing direct contact with and damage to the active layer, thus resolving the contradiction between completing the preparation process and avoiding active layer damage.
Solution Approach 2:
The patent applies a protective coating to the active layer before the photoresist stripping process. This preliminary protective action prevents the harmful etching effect from occurring in the first place, allowing the stripping solution to be used without damaging the active layer.
2Productivity
If yellow light process is applied, then the preparation process can proceed, but oxygen vacancy defect state increases in the IGZO layer
Solution Approach 1:
The patent performs the yellow light process in an inert atmosphere or under controlled environmental conditions that prevent the formation of oxygen vacancy defects. This allows the photolithography process to proceed efficiently while protecting the IGZO layer from degradation, thus maintaining both productivity and transistor performance.
Solution Approach 2:
The patent applies a protective treatment or coating to the IGZO layer before the yellow light process. This preliminary action prepares the IGZO layer to withstand the yellow light exposure without developing oxygen vacancy defects, thereby maintaining transistor performance while allowing the preparation process to continue.
3Object-affected harmful factors
If functional layer is added to protect active layer, then active layer damage is prevented, but device structure becomes more complex
Solution Approach 1:
The patent designs the functional layer to serve multiple purposes: protecting the active layer from damage, providing electrical connection, and potentially serving as part of the transistor structure itself. By making the protective layer multi-functional, the patent reduces the need for additional separate components, thereby limiting the increase in device complexity while maintaining protection.
Data Source
AI summary
The present disclosure provides an array substrate and a manufacturing method thereof, and a display panel. In the array substrate, a functional layer disposed between an active layer and a gate insulating layer protects the active layer during etching of the active layer, which prevents the active layer from damage and conducts a source/drain layer and the active layer, so that transistors in the array substrate work normally, solving the technical problem that current display panels damage the active layer during a preparation process, which causes performance of thin film transistors to decrease.