Array Substrate Single Patterning Gate Electrode
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing manufacturing processes for array substrates in display devices are complex and costly, requiring multiple patterning processes for forming electrodes, which increases equipment investment and production costs while reducing productivity.
Innovation Solution
The array substrate design includes a thin film transistor with a gate and source/drain in the same layer, where one of the electrodes is formed with the same material as the driving electrode, allowing for a single patterning process to form both, thereby simplifying the manufacturing procedure and reducing material costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple patterning processes are used to form common electrode and gate separately, then the display device achieves proper electrode formation, but the manufacturing complexity and cost increase significantly
Solution Approach 1:
The patent combines the formation of the common electrode and gate into a single patterning process. By forming both electrodes simultaneously from the same conductive material layer using one photolithography mask, the manufacturing process complexity is reduced while maintaining the required precision for both electrode formations.
Solution Approach 2:
The single patterning mask serves multiple functions by defining both the common electrode pattern and gate pattern in one exposure step. This universal approach eliminates the need for separate masking processes that would otherwise be required for each electrode type.
2Manufacturing precision
If multiple masking processes are used for forming different electrodes, then each electrode can be precisely formed, but the production cost and equipment investment increase
Solution Approach 1:
The patent merges the formation of multiple electrodes into a single patterning step, reducing the number of masking processes required. This consolidation decreases equipment investment and production costs while maintaining precise electrode formation through optimized mask design and material selection.
3Manufacturing precision
If separate patterning processes are used for common electrode and gate, then each electrode can be independently optimized, but the productivity decreases
Solution Approach 1:
By combining the patterning of common electrode and gate into one simultaneous process, the patent eliminates sequential processing steps, thereby improving manufacturing productivity. The single exposure and development cycle replaces multiple separate processes without sacrificing electrode quality.
Data Source
AI summary
The invention belongs to the field of display technology, and particularly provides an array substrate and a method for manufacturing the same, and a display device. The array substrate includes a base substrate, and a thin film transistor and at least one driving electrode provided on the base substrate, and the thin film transistor includes a gate, and a source and a drain provided in the same layer, wherein the gate, the source or the drain is formed with the same material as the at least one driving electrode, and thickness thereof is larger than that of the at least one driving electrode. Regarding the array substrate, the manufacturing procedure of the array substrate is effectively simplified, cost for mask plate and material is reduced, equipment investment is reduced, production cost is saved, productivity is improved, and competitiveness of the display device is increased, while the transmittance requirement is met.