Array Substrate Multi-Tone Mask Process for Display Brightness
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Solution Overview
Problem
The manufacturing process of conventional liquid crystal display panels is cumbersome, requiring multiple photolithography processes and lacking a white color filter film, which affects display brightness and color saturation.
Innovation Solution
A manufacturing method for an array substrate involving a thin-film transistor with red, green, blue, and white color resist layers, forming a planarization layer with different thicknesses for a first protection layer, spacer layer, and vias using a multi-tone mask, reducing the number of processes and enhancing transmittance and brightness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography processes are used to form protection layer, spacer layer and vias separately, then each layer can be formed with precise control, but the manufacturing process becomes cumbersome and time-consuming
Solution Approach 1:
The patent combines the formation of protection layer, spacer layer, and vias into a single photolithography process using a multi-tone mask. This merging of multiple separate processes into one step reduces manufacturing complexity and time while maintaining precise thickness control through different mask transmittance regions.
Solution Approach 2:
The patent introduces a new dimension to the photolithography process by using a multi-tone mask with different transmittance regions. This allows different thicknesses of the planarization layer to be formed in different areas simultaneously, enabling the creation of protection layer, spacer layer, and vias with varying thicknesses in a single process step.
2Illumination intensity
If white color filter film is added to control display brightness and color saturation, then display effect is improved, but the manufacturing process becomes more cumbersome requiring additional photolithography process
Solution Approach 1:
The patent merges the white color filter layer formation with the protection layer, spacer layer, and via formation process. By using a multi-tone mask during the planarization layer formation step, the white color filter is patterned simultaneously with other structures, eliminating the need for separate photolithography processes and reducing manufacturing complexity.
Solution Approach 2:
The planarization layer serves multiple functions: it acts as a protection layer in certain regions, forms spacer layers in other regions, creates vias in specific areas, and simultaneously patterns the white color filter layer. This multi-functionality reduces the number of separate processes needed while achieving the desired display performance.
Data Source
AI summary
A display panel, an array substrate and a manufacturing method are disclosed. The method includes steps of: providing a substrate; disposing a thin-film transistor on the substrate; disposing R color resist layer, G color resist layer, a blue B color resist layer and a white W color resist layer on the thin-film transistor; forming a planarization layer on the R color resist layer, the G color resist layer, the B color resist layer and the W color resist layer, and through a multi-tone mask to form a first protection layer, a spacer layer and a vias having different thicknesses. The present invention forms the first protection layer, the spacer layer and the vias only through one process so as to reduce the manufacturing process to reach the purpose of simplifying the process. Besides, the present invention also manufactures a W color resist layer to increase the transmittance and brightness.