Array Substrate Shield Metal Zones for High Aperture Ratio Displays
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Solution Overview
Problem
The manufacturing and assembly of high-resolution LTPS display devices require high precision to minimize the size of the black matrix, which increases the difficulty and can lead to decreased aperture ratio and power consumption due to small deviations in the color filter and array substrate alignment.
Innovation Solution
An array substrate with a shield metal layer comprising a first shield metal zone at the thin film transistor channel and a second shield metal zone at the data line, replacing the conventional black matrix, allowing for precise control and reduced alignment deviations during manufacturing and assembly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of moving object
If the width of the black matrix between adjacent color filter units is narrowed to increase aperture ratio, then the aperture ratio of pixel is improved, but the manufacturing precision and assembling precision requirements increase significantly
Solution Approach 1:
The shield metal layer is divided into multiple zones: a first shield metal zone positioned at the channel of the thin film transistor and a second shield metal zone positioned at the data line. This segmentation allows each zone to independently perform its light-blocking function without requiring tight spacing between adjacent black matrix structures, thereby maintaining aperture ratio while reducing precision requirements.
Solution Approach 2:
The invention transitions from the conventional approach of placing black matrix only on the color filter substrate to a three-dimensional arrangement where shield metal zones are positioned on both the color filter substrate (black matrix) and the array substrate (shield metal layer). This dimensional expansion allows light blocking to occur at multiple levels, enabling larger effective black matrix coverage without reducing the aperture opening size.
2Area of moving object
If the width of the black matrix between adjacent color filter units is narrowed to increase aperture ratio, then the aperture ratio of pixel is improved, but the assembling precision requirements increase significantly
Solution Approach 1:
The shield metal layer is divided into multiple zones: a first shield metal zone positioned at the channel of the thin film transistor and a second shield metal zone positioned at the data line. This segmentation allows each zone to independently perform its light-blocking function without requiring tight spacing between adjacent black matrix structures, thereby maintaining aperture ratio while reducing precision requirements.
Solution Approach 2:
The invention transitions from the conventional approach of placing black matrix only on the color filter substrate to a three-dimensional arrangement where shield metal zones are positioned on both the color filter substrate (black matrix) and the array substrate (shield metal layer). This dimensional expansion allows light blocking to occur at multiple levels, enabling larger effective black matrix coverage without reducing the aperture opening size.
3Area of moving object
If the black matrix width is reduced to meet high aperture ratio requirements, then the aperture ratio is improved, but the difficulty of manufacturing and assembling increases
Solution Approach 1:
The shield metal layer is divided into multiple zones: a first shield metal zone positioned at the channel of the thin film transistor and a second shield metal zone positioned at the data line. This segmentation allows each zone to independently perform its light-blocking function without requiring tight spacing between adjacent black matrix structures, thereby maintaining aperture ratio while reducing precision requirements.
Solution Approach 2:
The invention transitions from the conventional approach of placing black matrix only on the color filter substrate to a three-dimensional arrangement where shield metal zones are positioned on both the color filter substrate (black matrix) and the array substrate (shield metal layer). This dimensional expansion allows light blocking to occur at multiple levels, enabling larger effective black matrix coverage without reducing the aperture opening size.
Data Source
AI summary
The present invention discloses an array substrate comprising: a first substrate on which a thin film transistor and a data line are formed; and a shield metal layer comprising a first shield metal zone positioned at a location corresponding to a channel of the thin film transistor and a second shield metal zone positioned at a location corresponding to the data line. The present invention also discloses a display panel and a method for manufacturing the array substrate. The shield metal layer formed at the location on the array substrate corresponding to the data line, there is no any black matrix region between a color filter units along a direction corresponding to the data line. The display panel comprising the array substrate has increased aperture ratio of pixel, and difficulty of manufacturing the display panel is decreased.