Array Substrate Spacer Layer UV Reflection Control
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Solution Overview
Problem
Conventional display devices face issues with data lines being prone to open at intersecting parts due to differences in metal reflection during UV exposure, leading to uneven line widths and increased coupling capacitance, which affects the properties of the array substrate.
Innovation Solution
Incorporating a spacer layer with spacer units that overlap with data lines and other electrode layers, ensuring the spacer units are wider and longer than the overlapping areas, thereby reducing the effects of light reflection and maintaining uniform data line widths, and integrating an active layer for improved manufacturing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If data lines are formed at intersecting parts without spacer layer, then manufacturing process is simple, but line widths become uneven and opens occur
Solution Approach 1:
A spacer layer is introduced as an intermediary element between the data line and the common electrode line/gate line. This spacer layer acts as a mediator to prevent direct contact at intersecting parts, thereby maintaining uniform data line widths and preventing opens during UV exposure while managing the coupling capacitance between conductive layers.
Solution Approach 2:
The spacer layer is positioned in a different spatial dimension (vertical layering) relative to the data line and electrode lines. By utilizing the third dimension (height/thickness direction), the spacer provides separation without interfering with the planar layout, thus maintaining manufacturing simplicity while achieving precise width control.
2Reliability
If data lines overlap with electrode layers at intersections, then coupling capacitance increases, but manufacturing process is simpler
Solution Approach 1:
The spacer layer serves as an intermediary barrier between the data line and the electrode layers (common electrode line or gate line) at intersecting parts. This mediator prevents direct overlap and contact, ensuring data line continuity and preventing opens while controlling the coupling capacitance through controlled separation.
Solution Approach 2:
The spacer layer is selectively formed only at specific intersecting parts where data lines cross electrode layers, rather than uniformly across the entire substrate. This localized approach provides the necessary separation and quality control at critical points while maintaining manufacturing efficiency and avoiding unnecessary complexity in non-critical areas.
3Manufacturing precision
If UV exposure is performed without considering metal reflection differences, then manufacturing process is fast, but data line widths become uneven at intersections
Solution Approach 1:
The spacer layer is formed in advance before the UV exposure process for data line patterning. This preliminary structure preparation ensures that during subsequent UV exposure, the metal reflection differences at intersecting parts do not cause width variations, as the spacer already provides the necessary geometric control and separation.
Solution Approach 2:
The invention converts the harmful effect of metal reflection differences during UV exposure into a beneficial outcome. By strategically positioning the spacer layer, the reflection issues at intersections are transformed into an opportunity to precisely control data line widths, as the spacer creates defined geometric boundaries that override the reflection-induced width variations.
Data Source
AI summary
The present application discloses an array substrate comprising a first layer comprising a data line; at least one second layer comprising at least one data line overlapping area on intersections between the first layer and the at least one second layer; and a spacer layer between the first layer and the second layer. The spacer layer comprises a plurality of spacer units spaced apart from each other. Each of the plurality of spacer units is in an area corresponding to the overlapping area.