Array Substrate Storage Capacitor Design for Image Stability

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Solution Overview

Problem

The existing array substrates for liquid crystal displays have a small storage capacitor capacitance, which affects the stability of the displayed image.

Innovation Solution

The array substrate design includes a gate electrode and common electrode in the same layer, with a gate insulation layer, an active layer, and data lines in the same layer, and a pixel electrode in the same layer as the active layer, forming a storage capacitor with increased capacitance by using a metal-oxide semiconductor material and a metallization process to enhance the capacitance and reduce resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the storage capacitor is formed using conventional structures, then the manufacturing process is simple, but the storage capacitor capacitance is small which affects image stability

Engineering Contradiction:
Improveimage stabilityVSAvoidcapacitor structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention merges the storage capacitor electrode with the pixel electrode by forming them in the same layer. The pixel electrode serves dual functions as both the display electrode and the storage capacitor electrode, eliminating the need for a separate storage capacitor electrode structure. This merging approach increases storage capacitor capacitance while avoiding additional structural complexity

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The pixel electrode is designed to perform multiple functions: it serves as the display pixel electrode for liquid crystal control and simultaneously as the storage capacitor electrode for maintaining display stability. This multi-functional design resolves the contradiction by making the same structure serve both display and storage purposes

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If metal oxide semiconductor material is used with metallization treatment, then the capacitance and conductivity are improved, but the manufacturing process complexity increases

Engineering Contradiction:
Improveelectrical performanceVSAvoidmanufacturing process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention changes the electrical parameters of the semiconductor layer by applying metallization treatment to specific regions. By controlling the metallization process parameters (such as treatment time, temperature, and chemical composition), the semiconductor layer transforms from insulating to conductive state in designated areas, achieving improved electrical performance without adding separate conductive layers

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The semiconductor layer itself provides the conductive function after metallization treatment, eliminating the need for separate metal conductive layers. The treated semiconductor layer serves its own purpose as the conductive element, reducing the number of manufacturing steps and material layers required

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design effectively improves the display effect by increasing the storage capacitance and reducing resistance, leading to enhanced image stability and performance.

Implementation Method 1

forming the first transparent electrode by subjecting a portion of the metal oxide film to metallization treatment

Methodology Applied
Scientific EffectMetallization treatment:

Data Source

PatentEP3200231B1Array substrate and manufacturing method thereof
Publication Date: 2023.05.10 BOE TECHNOLOGY GROUP CO LTD
  • EP3200231B1 patent drawingFigure 1~3
  • EP3200231B1 patent drawingFigure 4~5
  • EP3200231B1 patent drawingFigure 6

AI summary

An array substrate, a manufacturing method thereof and a display device are provided. The array substrate comprises a base substrate (10), and a gate line (20) and a common electrode (21) provided in the sane layer, a gate insulation layer (30), an active layer (40), a source electrode (61) and a drain electrode (62) provided in the same layer; and a pixel electrode (50) provided in the same layer as the active layer (40), sequentially arranged on the base substrate (20).