Arylsulfonium Salt Photosensitive Composition for Sub-100nm Pattern Collapse
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Solution Overview
Problem
Current photosensitive compositions face challenges in forming fine patterns with line widths of 100 nm or less, particularly experiencing pattern collapse and performance differences between dense and isolated patterns when using ArF excimer lasers, due to inadequate combinations of resins, photoacid generators, additives, and solvents.
Innovation Solution
A photosensitive composition incorporating an arylsulfonium salt compound with a polycyclic hydrocarbon structure in the cation moiety, combined with a resin that decomposes under acidic conditions to increase solubility in alkali developers, enhancing pattern formation and reducing pattern collapse.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photosensitive compositions are used for fine pattern formation, then manufacturing process can be maintained, but pattern collapse occurs and profile quality deteriorates for line widths of 100 nm or less
Solution Approach 1:
The patent modifies the chemical composition parameters of the photosensitive material by incorporating specific compounds (sulfonium salt, iodonium salt, or diazonium salt photoacid generators combined with cyclic carbonate additives) to change the acid-catalyzed decomposition behavior of the resin, thereby improving pattern profile quality and preventing collapse at 100 nm scale
Solution Approach 2:
The patent creates a composite photosensitive composition by combining multiple functional components: photoacid generator (sulfonium/iodonium/diazonium salt), cyclic carbonate additive (trimethylene carbonate, tetrahydrofuran, or dioxane), and resin (polyhydroxystyrene or alicyclic hydrocarbon-based resin), where the synergistic interaction between components resolves the pattern collapse issue
2Adaptability or versatility
If conventional resin and photoacid generator combinations are used, then existing formulation can be maintained, but performance difference between dense and isolated patterns increases
Solution Approach 1:
The patent adjusts the chemical parameters of the photoacid generator (using sulfonium, iodonium, or diazonium salts with specific structures) and additive ratios to control acid generation and diffusion characteristics, enabling uniform performance across both dense and isolated pattern configurations at sub-100 nm dimensions
Solution Approach 2:
The cyclic carbonate compound acts as an intermediary that modulates the interaction between the photoacid generator and resin, controlling acid-catalyzed decomposition to achieve consistent results across different pattern densities by mediating the chemical reaction uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively improves pattern collapse and profile quality for fine patterns of 100 nm or less, ensuring better performance and consistency in both dense and isolated patterns.
Implementation Method 1
a photoacid generator capable of producing an acid in the exposed area upon irradiation with radiation such as far ultraviolet light
Implementation Method 2
a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer
Data Source
AI summary
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.