Asymmetric Electrostatic Filter for Ion Beam Control
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Solution Overview
Problem
Existing electrostatic modules in ion implantation systems suffer from contamination and erosion due to accumulated debris and sputtered material, which can lead to indirect substrate contamination and increased maintenance needs.
Innovation Solution
The electrostatic filter features a novel electrode assembly configuration with a beam bend of less than 25 degrees and a catch assembly to redirect sputtered material away from electrodes, preventing accumulation and contamination, while maintaining efficient ion beam control and deceleration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional electrostatic modules with multiple electrode pairs are used to control ion beam energy and shape, then ion beam control precision is improved, but electrode contamination and material accumulation increase
Solution Approach 1:
The patent applies asymmetry by configuring electrodes in an asymmetric arrangement rather than symmetric pairs. The electrostatic module includes a first electrode, second electrode, third electrode, and fourth electrode arranged asymmetrically to define a beam passage. This asymmetric configuration allows the ion beam to pass through while minimizing direct exposure of electrodes to sputtered material, thereby reducing contamination while maintaining beam control precision.
Solution Approach 2:
The patent introduces a spatial dimension solution by tilting the beam passage relative to the substrate surface. The beam passage is configured at an angle between 10 to 75 degrees relative to the substrate normal, creating a geometric relationship that prevents sputtered material from directly reaching the electrodes. This dimensional arrangement separates the electrode protection function from the beam control function, reducing contamination while preserving energy control capability.
2Manufacturing precision
If electrodes are positioned to effectively deflect and focus ion beam, then beam focusing capability is improved, but material accumulation on electrodes increases leading to flaking and erosion
Solution Approach 1:
The asymmetric electrode arrangement positions electrodes at different spatial locations and orientations relative to the beam passage. The first and second electrodes may be positioned on one side of the beam passage while third and fourth electrodes are positioned on another side, creating an asymmetric field configuration that achieves effective beam focusing while minimizing electrode exposure to harmful sputtered material, thereby improving both focusing capability and electrode durability.
Solution Approach 2:
The patent introduces the beam passage geometry and angular orientation as intermediary elements between the electrodes and the substrate. The tilted beam passage acts as a mediator that allows electrodes to maintain their focusing function while preventing direct line-of-sight exposure to sputtered material. This intermediary geometric configuration protects electrodes from erosion and flaking while preserving beam focusing precision.
3Object-generated harmful factors
If beam passage is configured with large bend angle to screen out energetic neutrals, then neutral screening effectiveness is improved, but ion beam energy control and stability deteriorate
Solution Approach 1:
The patent optimizes the beam bend angle parameter within a specific range (10 to 75 degrees relative to substrate normal) to achieve the optimal balance between neutral screening and energy stability. By configuring the beam passage at this optimized angular parameter, the system achieves effective screening of energetic neutrals while maintaining stable ion beam energy control, avoiding the deterioration that occurs with excessive bend angles.
Solution Approach 2:
The asymmetric configuration of the beam passage and electrodes creates an uneven geometric arrangement that provides effective neutral screening without requiring excessive beam bending. The asymmetric path allows ions to pass through while deflecting neutrals, achieving good screening effectiveness while maintaining beam energy stability through the optimized asymmetric geometry rather than symmetric large-angle bending.
4Ease of manufacture
If traditional symmetric electrode arrangements are used, then ease of manufacturing is improved, but maintenance complexity and difficulty increase due to contamination accumulation
Solution Approach 1:
While asymmetric electrode arrangements may slightly increase manufacturing complexity compared to symmetric designs, the patent achieves this through systematic asymmetric positioning of four electrodes rather than complex configurations. The asymmetric design dramatically simplifies maintenance by preventing contamination accumulation on electrodes, eliminating the need for frequent cleaning and reducing maintenance difficulty, thereby improving the overall ease of repair and operational reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces direct and indirect substrate contamination, minimizes maintenance by collecting resputtered material on easily serviceable surfaces, and ensures reliable ion beam delivery across a wide range of energies.
Implementation Method 1
The rod/electrode potentials are set to create electric fields in the electrostatic module causing the ion beam to decelerate, deflect and focus the ion beam
Implementation Method 2
The electrostatic module may function as an electrostatic lens and an electrostatic filter to control ion beam energy, ion beam shape, and ion beam size
Implementation Method 3
The ion source may comprise a chamber where ions are generated
Implementation Method 4
Ion implantation is a process of introducing dopants or impurities into a substrate via bombardment
Implementation Method 5
material from the substrate may be resputtered during implantation, and may be transported back onto surfaces of electrodes or other surfaces within the electrostatic module
Data Source
AI summary
An apparatus may include a main chamber, an entrance tunnel, having an entrance axis extending into the main chamber, and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, on a lower side of the exit tunnel; and a catch assembly, disposed within the main chamber, in a line of sight from an exterior aperture of the exit tunnel.


