Automatic Concentration Control for Semiconductor Chemical Mixtures
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Solution Overview
Problem
Manual adjustment of chemical concentrations in semiconductor processing tanks is labor-intensive and time-consuming, leading to inefficiencies and potential defects in semiconductor wafer production due to imprecise control of moisture or water content in chemical mixtures.
Innovation Solution
An automatic concentration control system utilizing a chemical sensor and electrically controllable valves to monitor and adjust the chemical mixture's properties, such as water content, in real-time, ensuring precise control and reducing human intervention.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual adjustment of chemical concentrations is used, then operational flexibility is maintained, but labor intensity increases and control precision deteriorates
Solution Approach 1:
The system enables self-service operation through automatic concentration control. The chemical sensor continuously monitors the chemical mixture concentration, and the control circuitry automatically adjusts the valve positioning to maintain the desired concentration level, eliminating the need for manual intervention and operator judgment.
Solution Approach 2:
The patent replaces manual mechanical valve adjustment with an automated electromechanical system. The control circuitry electronically processes sensor signals and automatically positions the valve, substituting human operational skills with an automated control system that provides consistent, precise control without fatigue or human error.
2Productivity
If manual monitoring and adjustment is performed, then system complexity remains low, but time consumption increases and productivity decreases
Solution Approach 1:
The system implements continuous feedback control where the chemical sensor monitors the actual concentration level, compares it with the target concentration, and the control circuitry automatically adjusts the valve positioning based on this feedback. This closed-loop control ensures the chemical mixture maintains the desired concentration level, improving productivity while managing system complexity through standardized control architecture.
Solution Approach 2:
The control system integrates multiple functions into a single automated unit: concentration sensing, signal processing, valve control, and process adjustment. This multi-functional integration improves productivity by eliminating separate manual operations while managing complexity through consolidated system design that can be applied across different chemical processing applications.
3Manufacturing precision
If manual chemical concentration adjustment is used, then equipment cost is low, but manufacturing precision deteriorates due to imprecise control
Solution Approach 1:
The patent replaces manual mechanical adjustment with automated electromechanical control to achieve precise concentration management. The electronic control system provides consistent, repeatable valve positioning that maintains accurate chemical concentrations, directly improving semiconductor wafer processing precision by eliminating variability introduced by manual operations.
Solution Approach 2:
The automatic control system continuously self-regulates chemical concentration through real-time sensing and adjustment, ensuring manufacturing precision is maintained without human intervention. This self-service capability eliminates the imprecision inherent in manual monitoring and adjustment, providing consistent quality control for semiconductor processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This system significantly reduces labor costs and time, enhances the stability of chemical concentrations, minimizes defects in semiconductor wafers by maintaining precise control over water or moisture content, and prevents production scrap due to incorrect chemical compositions.
Implementation Method 1
A chemical sensor senses a concentration of chemicals in the chemical mixture
Data Source
AI summary
Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.