Automated BIB Sample Handling for High-Throughput Polishing
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Solution Overview
Problem
Broad Ion Beam (BIB) polishing systems face inefficiencies due to the need for precise sample alignment and frequent maintenance caused by high material removal rates, leading to slowed workflow and downtime, limiting their commercial application.
Innovation Solution
The system efficiently processes multiple samples by pre-aligning samples with a first mask, using a dual BIB system with an additional BIB source for continuous operation, and integrating a laser for rapid material removal, allowing for automated processing with minimal user input and reduced downtime.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high primary energy beam currents are used in BIB systems to rapidly remove sample material, then sample preparation speed is improved, but the rate of redeposition of removed material onto the source increases, forcing more frequent source cleaning and causing system downtime
Solution Approach 1:
The system is divided into two independent BIB sources (first BIB source and second BIB source) that can operate separately. While one source is processing samples, the other can be cleaned or prepared, eliminating the downtime associated with source maintenance and allowing continuous operation
Solution Approach 2:
The dual-source configuration enables continuous sample preparation by allowing one source to work while the other undergoes maintenance. The system can switch between sources without interrupting the overall process, maintaining continuous productive action
2Productivity
If high primary energy beam currents are used to rapidly remove sample material, then material removal rate is improved, but precise alignment with masks becomes more critical and time-consuming, slowing workflow
Solution Approach 1:
Samples are pre-aligned with a first mask outside the vacuum chamber before being loaded into the BIB system. This preliminary alignment action is performed in advance, so that when the sample enters the vacuum chamber for high-current processing, the alignment is already complete, eliminating time loss during the actual sample preparation process
3Manufacturing precision
If precise alignment with masks is required for high current BIB processing, then sample preparation accuracy is improved, but the alignment process requires significant user skill and time, reducing workflow efficiency
Solution Approach 1:
The alignment operation is performed in advance outside the vacuum chamber using a first mask, separating the complex precision alignment task from the actual BIB processing. This allows users to complete the difficult alignment work beforehand without requiring specialized skills during the automated vacuum processing phase
Solution Approach 2:
The alignment function is extracted from the vacuum chamber environment and performed externally using a separate first mask. This removes the complexity of precision alignment from the controlled vacuum processing environment, allowing it to be handled as a preliminary preparation step
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances sample preparation throughput and uptime, enabling BIB systems to process multiple samples quickly and efficiently with reduced user oversight and maintenance requirements, making them more suitable for commercial applications.
Implementation Method 1
BIB polishing systems directing a high energy, unfocused or minimally focused beams of ions (e.g., Argon ions) at a sample, where the beam degrades and/or otherwise removes the portions of the sample upon which it is incident
Implementation Method 2
integrating a laser for rapid material removal
Data Source
AI summary
Systems and methods for efficiently processing multiple samples with a BIB system, are disclosed. An example method for efficiently processing multiple samples with a BIB system according to the present invention comprises removing an individual sample holder containing a sample from a storage location within the BIB system, wherein the BIB system includes multiple sample holders positioned in one or more storage locations, loading the individual sample holder onto a sample stage configured to hold the sample holder during polishing of the corresponding sample held by the individual sample holder, and causing a BIB source to emit a broad ion beam towards the sample, wherein the broad ion beam removes at least a portion of the sample upon which it is incident. Once a desired portion of the sample is removed, the sample holder is removed from the sample stage and loaded back into the storage location.