Automated DRC Test Pattern Generation for Complete Rule Coverage
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Solution Overview
Problem
The manual construction of Design Rule Check (DRC) test patterns is time-consuming and incomplete, failing to cover all design rules in the layout design rule manual, thereby compromising the accuracy of the DRC process in integrated circuit manufacturing.
Innovation Solution
A method and apparatus for generating DRC test patterns automatically, using a server or terminal to parse layout design rule information and layer configuration parameters, generating a batch of correct and erroneous patterns based on predefined rules and user-specified quantities, ensuring comprehensive coverage of design rules.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If manual construction of DRC test patterns is used, then flexibility in pattern creation is maintained, but time consumption increases and completeness of rule coverage deteriorates
Solution Approach 1:
The patent replaces the manual mechanical process of DRC test pattern construction with an automated computer-based system. The system automatically parses layout design rule information, generates test patterns according to predefined rules, and outputs complete pattern sets without manual intervention, thereby eliminating time consumption while maintaining or improving completeness of rule coverage
Solution Approach 2:
The system enables self-service automation where the DRC test pattern generation process is performed autonomously by the computer system itself. The system parses its own input data, applies generation rules automatically, and produces output patterns without requiring external manual operations, thus dramatically improving productivity while reducing time loss
2Reliability
If manual construction of DRC test patterns is used, then control over pattern details is maintained, but completeness of design rule coverage deteriorates
Solution Approach 1:
The patent implements a universal pattern generation system that can handle multiple design rules and pattern types through a single automated framework. The system parses layout design rule information and applies generation rules across all rule types uniformly, ensuring complete coverage of all design rules while maintaining the reliability needed for accurate DRC testing
Solution Approach 2:
The system automatically adjusts and varies pattern parameters according to different design rules and generation rules. By dynamically changing parameters such as pattern dimensions, spacing, and configurations based on parsed rule information, the system ensures comprehensive rule coverage while maintaining the precision required for reliable DRC testing
3Productivity
If automated pattern generation is implemented, then productivity improves and time loss reduces, but system complexity increases
Solution Approach 1:
The patent segments the automated pattern generation system into distinct functional modules: a parsing unit that processes layout design rule information, a generation unit that creates test patterns according to rules, and an output unit that delivers results. This modular segmentation manages system complexity by organizing functions into separate, manageable components while maintaining high productivity through their coordinated operation
Solution Approach 2:
The system introduces formatted parameter information as an intermediary data structure between the parsing unit and generation unit. This intermediary format standardizes the transfer of rule information and generation parameters, simplifying the interface between components and reducing overall system complexity while enabling efficient automated operation
Data Source
AI summary
A DRC test pattern generation method includes: receiving a DRC test pattern generation request, the DRC test pattern generation request carrying the number of correct patterns and the number of erroneous patterns; acquiring layout design rule information and corresponding layer configuration information, the layer configuration information including process layer configuration parameter information that is set according to a process type; parsing parameter information corresponding to each rule in the layout design rule information and the process layer configuration parameter information in the layer configuration information, and generating formatted parameter information corresponding to the each rule; and generating a corresponding number of correct patterns and a corresponding number of erroneous patterns corresponding to each rule according to the formatted parameter information.