Automated Wafer Test Assessment With Optical Probe Mark Detection

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Solution Overview

Problem

Current integrated circuit manufacturing processes face challenges in efficiently detecting and assessing defects on wafers, leading to increased time and cost due to human errors and manual inspections.

Innovation Solution

A test system comprising an assessment subsystem, an optical check subsystem, and a process control processor, which automates the detection of probe marks, generates identification data, and performs assessment operations to enhance productivity and reduce human errors.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If manual probe mark inspection is performed by operators, then detection capability is maintained, but human errors are introduced and test quality is affected

Engineering Contradiction:
Improveprobe mark detection accuracyVSAvoidtest quality
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent replaces manual mechanical inspection by operators with an automated optical inspection system that uses imaging devices and computer processing to detect and measure probe marks. This substitution eliminates human errors while maintaining detection capability through automated image analysis and coordinate measurement systems.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Adaptability or versatility

If manual inspection processes are used, then flexibility in handling various test cases is maintained, but the process becomes highly time consuming

Engineering Contradiction:
Improveinspection flexibilityVSAvoidtest cycle time
Core Design Contradiction:
Adaptability or versatilityVSProductivity

Solution Approach 1:

The patent implements an automated system where the optical inspection apparatus independently performs probe mark detection, image processing, coordinate extraction, and quality assessment without requiring operator intervention. The system automatically analyzes test images, calculates measurements, and generates reports, thereby maintaining versatility while dramatically reducing test cycle time and increasing productivity.

Inventive Principle:
Principle #25Self-service

3Measurement precision

If operators and engineers are deployed for probe mark detection, then detection capability is ensured, but the cost of production increases

Engineering Contradiction:
Improveprobe mark detection capabilityVSAvoidproduction cost
Core Design Contradiction:
Measurement precisionVSEase of manufacture

Solution Approach 1:

The patent replaces human operators and engineers with an automated optical inspection system consisting of imaging devices, processors, and software algorithms. This automation maintains probe mark detection capability while eliminating labor costs associated with manual inspection, thereby reducing overall production cost.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Reliability

If customer complaint-based detection is used, then product quality issues are identified, but service quality and time to market are affected

Engineering Contradiction:
Improveproduct quality identificationVSAvoidtime to market
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent performs probe mark inspection and quality assessment proactively during the manufacturing process rather than waiting for customer complaints. The automated system detects and measures probe marks in real-time, identifies potential quality issues before they become customer complaints, and enables preventive actions that reduce time to market while maintaining high product quality.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS20250292390A1Test system and test method
Publication Date: 2025.09.18 NAN YA TECH
  • US20250292390A1 patent drawing
  • US20250292390A1 patent drawing
  • US20250292390A1 patent drawing

AI summary

A test system includes an assessment subsystem, an optical check subsystem and a process control processor. The assessment subsystem is configured to receive a test data from a wafer test apparatus, in which the test data comprises a test image of a wafer. The assessment subsystem is configured to receive an analyzed yield data of the wafer and to receive an identification data based on the test image. The process control processor is configured in response to the wafer test apparatus to perform a test operation to generate the test data, in response to the optical check subsystem to identify an image specification of probe marks in the test image and to generate the identification data, and in response to the assessment subsystem to perform an assessment operation to generate an assessment result based on the test data, the analyzed yield data, and the identification data.