Auxiliary Processing Chamber Integrated with Loadlock
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Solution Overview
Problem
In semiconductor processing systems, contamination can occur when 'dirty' processes in standard processing chambers contaminate the main vacuum frame, and substrates often need additional processing like stripping, which requires transferring them to external systems, reducing throughput.
Innovation Solution
An auxiliary processing chamber is integrated with the loadlock, allowing direct substrate transfer between the loadlock and the secondary processing chamber, and optionally with the main frame, enabling independent operation and reducing contamination by having gate valves between these chambers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If substrates are transferred to external systems for additional processing like stripping, then additional processing can be performed, but system throughput is reduced due to transfer time
Solution Approach 1:
The patent combines the loadlock and auxiliary processing chamber into a single integrated unit. The auxiliary processing chamber is directly connected to the loadlock, allowing substrates to be transferred for additional processing without leaving the vacuum environment or requiring external system transfers, thus maintaining high throughput while providing versatile processing capabilities
2Productivity
If substrates are processed in standard processing chambers, then primary processing can be performed, but contamination occurs when dirty processes contaminate the main vacuum frame
Solution Approach 1:
The patent segments the vacuum system into a main frame and a separate auxiliary processing chamber that is directly connected to the loadlock. This segmentation isolates potentially contaminating processes in the auxiliary chamber from the main vacuum frame, allowing dirty processes to be performed without contaminating the main system while maintaining processing efficiency
Solution Approach 2:
The auxiliary processing chamber is extracted as a separate functional unit from the main processing chambers. It is positioned between the loadlock and main frame, allowing substrates to undergo additional processing in an isolated environment that prevents contamination of the main vacuum frame while maintaining overall system productivity
3Ease of operation
If gate valves are opened between loadlock and main frame for substrate transfer, then substrates can be transferred, but contamination risk increases
Solution Approach 1:
The auxiliary processing chamber serves as an intermediary between the loadlock and main frame. Substrates can be transferred from the loadlock to the auxiliary chamber and then to the main frame through separate gate valve operations, allowing substrate transfer while minimizing the risk of contamination by isolating the transfer path from the main vacuum frame
Data Source
AI summary
A system for processing substrates having an atmospheric front end and a vacuum main frame, primary processing chambers attached to the main frame, a loadlock positioned between the front end and the main frame, and at least one secondary processing chamber attached to the loadlock.