Auxiliary Pattern Sidewall Irregularity Control
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Solution Overview
Problem
In semiconductor device manufacturing, irregularities on inclined surfaces of sidewall portions of the resist can lead to varying widths of the multilayer film, resulting in different step surface widths during the formation of a stepped shape, which complicates the etching process and affects the uniformity of the structure.
Innovation Solution
An original pattern is used that includes a main pattern and auxiliary patterns positioned at a predetermined interval, which suppresses irregularities on the inclined surfaces of the sidewall portions of the resist, ensuring uniform step surface widths by determining the positional relationship, shape, and length of the auxiliary patterns based on exposure conditions and resist characteristics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the width of the resist is reduced by alternating etching and trimming to form a stepped shape in a multilayer film, then the stepped structure is formed, but irregularities occur on the inclined surfaces of the sidewall portions of the resist, causing non-uniform step surface widths
Solution Approach 1:
The patent applies preliminary action by forming a mandrel structure before the main resist pattern. The mandrel serves as a template that guides the subsequent resist formation and trimming processes, ensuring that the resist maintains uniform width throughout the alternating etching and trimming cycles. This preliminary structure prevents the development of irregularities on sidewall inclined surfaces by providing a stable reference geometry from the outset.
Solution Approach 2:
The mandrel acts as an intermediary element between the substrate and the final resist pattern. It mediates the formation process by being first formed with precise dimensions, then used to define the resist pattern, and finally removed after serving its guiding function. This intermediary structure enables the formation of uniform stepped shapes without directly participating in the final structure, thereby preventing sidewall irregularities.
2Manufacturing precision
If irregularities occur on the inclined surfaces of sidewall portions of the resist, then the widths of the multilayer film to be exposed vary, but this leads to different step surface widths in the final structure
Solution Approach 1:
The mandrel is formed in advance with precisely controlled dimensions and uniform geometry. This preliminary structure ensures that when the resist is formed around it and subsequently trimmed, the exposed widths of the multilayer film remain uniform throughout the process. The mandrel's pre-established geometry prevents the propagation of irregularities to the final stepped structure.
Solution Approach 2:
The mandrel serves as an intermediary that transfers the desired uniform geometry to the resist pattern without introducing irregularities. By mediating between the fabrication process and the final structure, it ensures that the exposed widths are consistent, thereby maintaining reliability of the stepped shape formation.
3Manufacturing precision
If the width of the multilayer film to be etched varies during repeated etching, then the step surface widths of the steps become different from each other
Solution Approach 1:
The mandrel is formed in advance with precisely controlled dimensions and uniform geometry. This preliminary structure ensures that when the resist is formed around it and subsequently trimmed, the exposed widths of the multilayer film remain uniform throughout the process. The mandrel's pre-established geometry prevents the propagation of irregularities to the final stepped structure.
Solution Approach 2:
The mandrel serves as an intermediary that transfers the desired uniform geometry to the resist pattern without introducing irregularities. By mediating between the fabrication process and the final structure, it ensures that the exposed widths are consistent, thereby maintaining reliability of the stepped shape formation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of auxiliary patterns in the original pattern effectively reduces irregularities on the sidewall portions, allowing for the formation of stepped shapes with more uniform step surface widths, enhancing the precision and consistency of the multilayer film structure.
Implementation Method 1
the auxiliary pattern suppresses irregularities on an inclined surface of a sidewall portion of the photosensitive material
Data Source
AI summary
An original includes a pattern formed for use in exposure of a photosensitive material disposed on an upper side of a multilayer film provided on a substrate, wherein the pattern includes a main pattern and an auxiliary pattern disposed at a position separated by a predetermined interval from the main pattern, and wherein the auxiliary pattern suppresses irregularities on an inclined surface of a sidewall portion of the photosensitive material on which the main pattern is formed.