Auxiliary Stage for STEM Specimen Preparation

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Solution Overview

Problem

In the semiconductor fabrication process, STEM specimens require precise preparation techniques, including platinum coating and carbon removal, which are hindered by the use of clay stages in traditional sputtering and the incompatibility of current plasma cleaners with STEM specimens, leading to contamination and resolution issues.

Innovation Solution

An auxiliary stage with a silicon-containing material structure, resembling a reversed T shape, is designed to hold STEM specimens during preparation processes, allowing for secure placement in various tools like platinum sputters and plasma cleaners, and can be made from discarded wafers to prevent solvent pollution and facilitate efficient specimen handling.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If clay is used as a specimen stage in traditional platinum sputter, then the specimen can be held during sputtering, but the solvent in the clay will pollute the chamber and affect specimen quality

Engineering Contradiction:
Improvespecimen holding capabilityVSAvoidchamber pollution
Core Design Contradiction:
Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The patent extracts the harmful solvent component from the specimen stage system by replacing clay-based stages with silicon-containing material stages that do not contain solvents, thereby eliminating chamber pollution while maintaining specimen holding capability

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the material parameter of the specimen stage from clay-based (with solvent) to silicon-containing material (without solvent), fundamentally altering the chemical composition to eliminate harmful emissions during sputtering

Inventive Principle:
Principle #35Parameter changes

2Object-affected harmful factors

If current plasma cleaner is used, then carbon can be removed from TEM specimens, but STEM specimens cannot be fixed properly in the chamber

Engineering Contradiction:
Improvecarbon accumulation removalVSAvoidspecimen compatibility
Core Design Contradiction:
Object-affected harmful factorsVSAdaptability or versatility

Solution Approach 1:

The patent designs a universal silicon-containing material stage that can accommodate both TEM and STEM specimens, enabling the plasma cleaner to process both specimen types effectively by providing a compatible mounting solution for STEM specimens in addition to existing TEM specimen support

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Productivity

If traditional specimen preparation methods are used, then specimens can be processed, but the preparation process is incompatible with STEM specimen requirements

Engineering Contradiction:
Improvespecimen processing capabilityVSAvoidspecimen preparation quality
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent changes the material parameter of the specimen stage to silicon-containing material, which is compatible with STEM specimen requirements and does not contaminate the specimen during preparation processes like platinum sputtering and plasma cleaning

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The silicon-containing material stage acts as an intermediary between the specimen and the processing tools (sputter, plasma cleaner), providing a compatible interface that enables proper specimen preparation without contamination or damage

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The auxiliary stage effectively supports STEM specimen preparation by preventing contamination, maintaining high resolution, and enabling efficient processing in multiple tools, thereby improving the reliability and yield of semiconductor devices.

Implementation Method 1

a layer of platinum is coated on the specimen by a platinum sputter to increase the specimen conductivity and the surface resolution

Methodology Applied
Scientific EffectSputtering: Sputtering

Implementation Method 2

a plasma cleaner is used to clean carbon accumulated on the specimen

Methodology Applied
Scientific EffectPlasma cleaning: Plasma

Data Source

PatentUS8513620B2Auxiliary stage and method of utilizing auxiliary stage
Publication Date: 2013.08.20 MICRON TECHNOLOGY INC
  • US8513620B2 patent drawing
  • US8513620B2 patent drawing
  • US8513620B2 patent drawing

AI summary

An auxiliary stage for holding an electron microscope specimen includes a bottom part and a supporting part. The bottom part includes a first top surface, and the supporting part includes a second top surface and a side surface. The supporting part is fixed on the first top surface, and the side surface of the supporting part is substantially perpendicular to the first top surface of the bottom part. Therefore, the auxiliary stage is in a shape of a reversed T. A slit is embedded in the second top surface of the supporting part. A specimen holder is mounted in the slit, and a specimen is fixed on the specimen holder.