Azole Cleaning Agent for Copper-Resin Adhesion in Semiconductor Packaging

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Solution Overview

Problem

Semiconductor devices face issues with peeling between a molded resin and a copper frame due to thermal stress, oxidation, and chemical treatment, which compromises their reliability.

Innovation Solution

A cleaning agent containing an azole-based compound with functional groups like glycidyl, hydrolyzable silyl, and amino groups is used to clean the copper surfaces, removing impurities and preventing oxidation, thereby enhancing adhesion to the resin.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If copper is used as frame material for good thermal conduction, then thermal conduction is improved, but peeling occurs at the joining interface between copper and molded resin due to oxidation and contamination

Engineering Contradiction:
Improvethermal conductionVSAvoidjoining interface stability
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent introduces an azole-based compound as an intermediary substance between copper and molded resin. This compound forms a protective film on the copper surface that prevents oxidation and contamination while maintaining good thermal conduction. The azole-based compound acts as a mediator that allows both thermal transfer and adhesion to resin simultaneously, resolving the contradiction between thermal conduction and interface stability.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent creates a composite structure consisting of copper frame, azole-based compound film, and molded resin. This multi-layer composite material system combines the thermal conduction advantage of copper with the protective and adhesive properties of the azole-based compound, eliminating peeling at the joining interface while maintaining excellent thermal performance.

Inventive Principle:
Principle #40Composite materials

2Object-affected harmful factors

If a thick oxide film is formed on copper surface, then oxidation protection is improved, but peeling is accelerated by internal destruction

Engineering Contradiction:
Improveoxidation protectionVSAvoidpeeling resistance
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

The patent changes the chemical composition and thickness parameters of the oxide film by introducing an azole-based compound. Instead of allowing a thick natural oxide film to form, the azole-based compound creates a thin, controlled protective film with optimal thickness and composition. This film provides sufficient oxidation protection while preventing internal destruction that would cause peeling, thus resolving the contradiction between oxidation protection and peeling resistance.

Inventive Principle:
Principle #35Parameter changes

3Reliability

If chemical treatment is applied to copper surface, then adhesion to resin is improved, but contamination occurs and reliability decreases

Engineering Contradiction:
Improveadhesion strengthVSAvoidcontamination
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent replaces traditional mechanical or harsh chemical surface treatment methods with a chemical vapor deposition approach using azole-based compound. This compound vapor deposits onto the copper surface to form a protective film that inherently provides good adhesion to resin without requiring aggressive surface treatments. The azole-based compound system substitutes harmful mechanical/chemical treatments with a cleaner, more controlled deposition process that maintains adhesion while avoiding contamination.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The cleaning agent effectively suppresses surface oxidation and discoloration, improving the adhesion between copper components and the resin, thus preventing peeling and ensuring high reliability of semiconductor devices.

Implementation Method 1

The cleaning agent includes an azole-based compound having a group including at least one selected from the group consisting of a glycidyl group, a hydrolyzable silyl group, and an amino group... suppresses oxidation of the surface to suppress discoloration of the surface

Methodology Applied
Scientific EffectOxidation inhibition: Oxidation

Implementation Method 2

cleaning the conductor and the semiconductor chip with the cleaning agent... removing impurities and preventing oxidation

Methodology Applied
Scientific EffectChemical cleaning:

Implementation Method 3

The cleaning agent includes an azole-based compound having a group including at least one selected from the group consisting of a glycidyl group, a hydrolyzable silyl group, and an amino group... improving the adhesion between copper components and the resin

Methodology Applied
Scientific EffectAdhesion enhancement through functional groups: Adhesive

Data Source

PatentUS12421479B2Cleaning agent and method for manufacturing semiconductor device
Publication Date: 2025.09.23 KK TOSHIBA
  • US12421479B2 patent drawing
  • US12421479B2 patent drawing
  • US12421479B2 patent drawing

AI summary

According to one embodiment, there is provided a cleaning agent. The cleaning agent includes an azole-based compound having a group including at least one selected from the group consisting of a glycidyl group, a hydrolyzable silyl group, and an amino group.