Azole Wastewater Removal via Metal Complex Precipitation
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Solution Overview
Problem
Existing wastewater treatment methods for semiconductor effluents containing azole compounds, such as 1,2,4-triazole, are inadequate in reducing azole concentrations to meet nitrification process requirements, often requiring dilution or additional oxidation steps that increase complexity and costs.
Innovation Solution
A method involving the addition of transition metal (II) ions, such as Cu2+, Zn2+, and Mn2+ ions, to form a transition metal-azole complex, followed by pH adjustment and coagulation/flocculation to create an insoluble complex, which is then removed via solid-liquid separation, allowing direct nitrification without prior oxidation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If oxidation steps (ozone, hydrogen peroxide, UV irradiation) are used to remove azole compounds, then azole concentration is reduced, but treatment process complexity and cost increase
Solution Approach 1:
The invention changes the chemical form of azole compounds by adjusting pH to form metal-azole complexes, transforming the treatment mechanism from oxidation to precipitation. This parameter change (pH adjustment) enables removal without complex oxidation equipment while achieving the same concentration reduction goal
Solution Approach 2:
The invention extracts azole compounds from wastewater by forming insoluble metal-azole complexes that can be separated through solid-liquid separation. This extraction approach removes the harmful substance without requiring oxidation steps, simplifying the treatment process
2Quantity of substance
If ferrous sulfate is used to form iron-azole complexes, then azole compounds are removed, but large amounts of chemical reagents are consumed
Solution Approach 1:
The invention uses copper ions that serve multiple functions: they form insoluble complexes with azole compounds for removal, and they are naturally present in semiconductor wastewater from copper etching processes. This multi-functionality reduces the need for additional chemical reagents while achieving effective azole removal
Solution Approach 2:
The invention utilizes copper ions already present in the semiconductor wastewater to remove azole compounds through complex formation. The wastewater's own components are used for treatment, eliminating or reducing the need for external chemical reagents like ferrous sulfate
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively reduces azole concentrations to below 1 mg/L, enabling compliance with nitrification discharge limits and simplifying the treatment process by eliminating the need for upstream oxidation steps.
Implementation Method 1
adding a solution comprising transition metal (II) ions to a wastewater that includes an azole compound; and allowing the transition metal (II) ions and the azole compound in the wastewater to form a transition metal-azole complex in the wastewater
Implementation Method 2
The transition metal-azole complex may be removed, such as through coagulation, flocculation, and/or a solid-liquid separation process
Implementation Method 3
The transition metal-azole complex may be removed, such as through coagulation, flocculation, and/or a solid-liquid separation process
Data Source
AI summary
The present disclosure provides a method for reducing or removing azole-based compounds from a wastewater, such as a semiconductor wastewater. The method includes adding a solution comprising transition metal (II) ions to a wastewater that includes an azole compound; and allowing the transition metal (II) ions and the azole compound in the wastewater to form a transition metal-azole complex in the wastewater. The transition metal ions may be Cu2+ ions and/or Zn2+ ions.