Semiconductor B-Spline Layout Editing for Curvilinear Precision
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Solution Overview
Problem
Current semiconductor design layouts face challenges in accurately representing curvilinear features due to the limitations of polygon-based formats like GDSII and OASIS, which are inadequate for advanced lithography processes, leading to complexities in modifying curvilinear patterns and maintaining geometric precision.
Innovation Solution
A computerized system is employed to modify B-spline curves in semiconductor design layouts by selecting control points based on a target point's location and applying a transition function to determine displacements, ensuring geometric properties like continuity and smoothness are preserved.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If polygon-based formats (GDSII, OASIS) are used to represent design layouts, then file compatibility and ease of manufacture are improved, but manufacturing precision and ability to represent curvilinear features deteriorate
Solution Approach 1:
The patent transforms the representation parameters of curvilinear features from polygonal approximations (discrete straight-line segments) to mathematical curve definitions (continuous functions with control points). This parameter change enables exact representation of curved geometries required by advanced lithography processes while maintaining file format compatibility through structured data organization.
Solution Approach 2:
The patent introduces native curvilinear representation using B-spline curves and control points, replacing the traditional polygonal (straight-line) approximation method. This allows the design layout to accurately represent curved features essential for nanoscale device fabrication, directly addressing the limitation of polygon-based formats in capturing complex curvilinear geometries.
2Manufacturing precision
If curvilinear formats are introduced to accurately represent curves, then manufacturing precision is improved, but device complexity and file structure complexity increase
Solution Approach 1:
The patent segments the curvilinear pattern into multiple B-spline curves, each defined by a set of control points. This segmentation allows complex curvilinear geometries to be represented through multiple simpler curve segments, making the data structure manageable while maintaining manufacturing precision. Each curve segment can be independently processed and modified.
Solution Approach 2:
The patent creates a universal curvilinear representation framework that can handle various types of curves (B-splines, Bezier curves) through a common data structure using control points and basis functions. This multi-functional approach unifies the representation of different curvilinear features, reducing overall system complexity despite the enhanced capabilities.
3Adaptability or versatility
If control points are adjusted to modify curvilinear patterns, then adaptability is improved, but maintaining geometric properties (continuity, smoothness) becomes more difficult
Solution Approach 1:
The patent employs feedback mechanisms through the B-spline mathematical framework, where control points influence the curve geometry through basis functions. When control points are adjusted, the continuous mathematical relationship automatically maintains geometric properties like continuity and smoothness, providing inherent feedback that preserves curve quality during modification.
Solution Approach 2:
The patent introduces dynamic adaptability through the B-spline control point system, where the curve geometry dynamically adjusts to control point positions while maintaining mathematical continuity. This allows flexible modification of curvilinear patterns while the underlying mathematical structure ensures geometric properties are preserved, enabling both adaptability and reliability.
Data Source
AI summary
There is provided a system and method of modifying a curvilinear pattern in a design layout of a semiconductor specimen. The method includes obtaining a basis spline (B-spline) curve contouring at least part of the curvilinear pattern, and a target displacement for a target point on the B-spline curve, the B-spline curve defined based on a set of control points; selecting, from the set of control points, one or more control points to be adjusted based on the location of the target point on the B-spline curve; and determining one or more displacements of the one or more control points based on a transition function, so as to obtain, upon moving the one or more control points according to the one or more displacements thereof, a modified B-spline curve comprising the target point moved according to the target displacement.