Backplane Pad Electrode Side Protection Layer
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Solution Overview
Problem
The formation of pixel electrodes in display devices can cause galvanic reactions between silver and aluminum electrodes, leading to corrosion and short-circuits of the pad electrodes, which damages the backplane.
Innovation Solution
A method of manufacturing a backplane that includes forming a side protection layer on the sidewall of the pad electrode using a combination of materials from the insulation layer and etching gases, such as chlorine and fluorine, to prevent corrosion and short-circuits, while also using chemical mechanical polishing to ensure the side protection layer does not exceed the pad electrode's surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the pixel electrode layer is etched to form the pixel electrode, then the pixel electrode can be formed, but galvanic reaction occurs between the pixel electrode layer and pad electrode causing corrosion and short-circuits
Solution Approach 1:
An etch-stop layer is introduced as an intermediary between the pixel electrode layer and the pad electrode. This etch-stop layer prevents direct contact between the two electrode layers during the etching process, thereby eliminating the galvanic reaction pathway while still allowing the pixel electrode to be formed through the insulation layer.
Solution Approach 2:
The insulation layer is segmented into multiple layers with different etchability characteristics. By stacking insulation layers with varying resistance to etching, the patent creates a structured barrier system that controls the etching process and prevents harmful interactions between electrodes while maintaining manufacturing precision.
2Manufacturing precision
If the pixel electrode layer is etched, then the pixel electrode can be formed, but the pad electrode may be damaged by exposure to etching materials
Solution Approach 1:
The etch-stop layer serves as a protective intermediary that blocks the etchant from reaching the pad electrode. This intermediary layer allows the etching process to proceed for pixel electrode formation while simultaneously protecting the pad electrode from exposure to harmful etching materials.
Solution Approach 2:
The etch-stop layer is formed in advance before the pixel electrode layer is etched. This preliminary protective action ensures that when the etching process occurs, the pad electrode is already protected, preventing damage before it can happen.
3Reliability
If standard reduction potentials of pixel electrode layer and pad electrode materials are greatly different, then galvanic reaction is more likely to occur, but this difference is necessary for electrode functionality
Solution Approach 1:
The etch-stop layer acts as a physical intermediary that separates the two electrode materials with different standard reduction potentials. This separation prevents the electrochemical pathway for galvanic reaction while allowing each electrode to maintain its functional material composition and properties.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The side protection layer effectively prevents damage to the pad electrodes by covering their sidewalls and preventing exposure to materials that induce galvanic reactions, thereby maintaining the integrity of the backplane and preventing corrosion and short-circuits.
Implementation Method 1
etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer
Implementation Method 2
forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer
Implementation Method 3
using chemical mechanical polishing to ensure the side protection layer does not exceed the pad electrode's surface
Data Source
AI summary
A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.


