Backside-Connected SRAM Layout for Latch-Up-Free Edge Shrink
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Solution Overview
Problem
The existing SRAM structures require large edge regions for tap cells to prevent latch-up issues, which increases the geometry size and reduces the functional density of SRAM chips.
Innovation Solution
The SRAM structure eliminates the need for tap cells in the edge region by connecting source/drain features to Vss or Vdd from the backside, allowing for a reduced edge region width and eliminating the P-N junctions, thereby reducing the overall geometry size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If tap cells are included in the edge region to prevent latch-up issues, then reliability is improved, but the geometry size increases
Solution Approach 1:
The patent extracts and removes the tap cells from the edge region, eliminating the harmful P-N junctions that cause latch-up issues. Instead of including tap cells to prevent latch-up, the invention uses a different approach by forming the bit cell array directly on the substrate without requiring separate tap cell structures, thereby reducing geometry size while maintaining reliability
Solution Approach 2:
Instead of the conventional approach of adding tap cells to prevent latch-up (positive action), the patent inverts the approach by deliberately creating P-N junctions within the bit cell structure itself that serve the protective function, thereby eliminating the need for separate tap cells and reducing overall geometry size
2Reliability
If tap cells are included in the edge region, then latch-up protection is achieved, but functional density decreases
Solution Approach 1:
The patent extracts tap cells from the edge region configuration, removing the structures that consume area without contributing to core memory functionality. By eliminating these non-functional elements and integrating latch-up protection directly into the bit cell structure, the functional density is improved as more of the chip area can be used for active memory cells
Solution Approach 2:
The patent makes the bit cell structure itself multi-functional by incorporating P-N junctions that simultaneously serve as part of the memory cell operation and as latch-up protection. This eliminates the need for separate dedicated protection structures, allowing the same area to serve both storage and protection functions, thereby increasing functional density
Data Source
AI summary
A static random-access memory (SRAM) structure and the manufacturing method thereof are disclosed. An exemplary SRAM structure includes a first source/drain (S/D) feature and a second S/D feature formed in an interlayer dielectric layer (ILD) of a bit cell region of the SRAM structure, a frontside via electrically connecting to the first S/D feature, and a first backside via electrically connecting to the second S/D feature. The first S/D feature and the second S/D feature are of a same type.


