Barrier Rib Printing Substrate for Wide Narrow Line Patterns
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Solution Overview
Problem
Existing printing technologies face challenges in forming both wide and narrow line width patterns using a single printing substrate, often resulting in inappropriate pattern separation and breakage due to limitations in etching processes, particularly with dry etching being time-consuming and costly, and wet etching struggling with accurate formation of patterns with line widths greater than 100 μm.
Innovation Solution
Incorporating barrier rib patterns between adjacent printing plate patterns on the substrate, which are formed using wet etching, allows for the correct formation of both wide and narrow line width patterns by preventing target pattern forming material from adhering to gaps between plates, enabling the material to extend and fill in gaps during the printing process, thus ensuring accurate pattern formation without separation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If wet etching is used to form printing plate patterns with large gaps (100 μm or more), then the etching process is simpler and faster, but the target pattern forming material inappropriately adheres to the printing substrate between adjacent patterns, causing pattern separation and breakage
Solution Approach 1:
A barrier rib pattern is introduced as an intermediary structure between adjacent printing plate patterns. This barrier rib prevents target pattern forming material from inappropriately adhering to the printing substrate in gap regions, while allowing the etching process to remain simple and efficient. The barrier rib acts as a mediator that resolves the conflict between process simplicity and pattern formation accuracy.
Solution Approach 2:
The printing plate pattern structure is segmented into multiple components: the main printing plate patterns and the barrier rib patterns positioned between them. This segmentation allows the barrier ribs to independently control material adhesion in gap regions, preventing pattern separation while maintaining the overall etching process efficiency.
2Device complexity
If a single printing substrate is used for both wide and narrow line width patterns, then device complexity is reduced, but patterns with line widths of 100 μm or more suffer from inappropriate separation and breakage
Solution Approach 1:
The barrier rib pattern serves as an intermediary structure that enables a single printing substrate to reliably produce both wide and narrow line width patterns. By preventing inappropriate material adhesion in gap regions, the barrier rib ensures pattern integrity across different line width scales, eliminating the need for separate printing substrates.
Solution Approach 2:
The barrier rib pattern structure provides universal applicability for different pattern types (wide and narrow line widths) on a single printing substrate. The same barrier rib design effectively prevents pattern separation across various line width scales, making the printing substrate universally capable of producing diverse patterns with high reliability.
3Manufacturing precision
If dry etching is used to form printing plate patterns, then manufacturing precision is improved, but the process time and manufacturing cost increase significantly
Solution Approach 1:
The barrier rib pattern enables wet etching to achieve precision comparable to dry etching by preventing inappropriate material adhesion. This intermediary structure allows the use of simpler, faster wet etching processes while maintaining high pattern formation accuracy, thereby reducing process time without sacrificing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the successful printing of both wide and narrow line width patterns on a single substrate, preventing inappropriate gaps and ensuring accurate pattern formation, thereby improving the efficiency and cost-effectiveness of the fabrication process for liquid crystal display devices.
Implementation Method 1
Incorporating barrier rib patterns between adjacent printing plate patterns on the substrate, which are formed using wet etching, allows for the correct formation of both wide and narrow line width patterns by preventing target pattern forming material from adhering to gaps between plates
Implementation Method 2
which are formed using wet etching
Data Source
AI summary
A printing apparatus adapted for printing wide line width and narrow line width patterns with one printing plate when fabricating a liquid crystal display device is disclosed. The printing apparatus includes a printing roll having target pattern forming material spread thereon, a printing substrate have at least one pair of adjacent printing plate patterns and at least one barrier rib pattern therebetween, and a target substrate. The printing substrate is configured to receive target pattern forming material from the printing roll and the target substrate is configured to receive target pattern forming material remaining on the printing roll following transfer of target forming material to the printing substrate.