Base Composition for Directed Self-Assembly Lithography Rectangularity
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Solution Overview
Problem
Current directed self-assembly lithography methods face challenges in forming ultrafine patterns with high rectangularity for advanced electronic devices, as existing methods struggle to achieve uniform phase separation and pattern formation on silicon and metal-containing substrates.
Innovation Solution
A composition for a base containing a compound with an oxo acid group and a solvent is used for substrate treatment, followed by the formation of a directed self-assembling film with phase separation, allowing for the removal of specific phases to create patterns with improved rectangularity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional directed self-assembly lithography methods are used, then pattern formation is achieved, but the rectangularity and uniformity of the patterns are insufficient for advanced electronic devices
Solution Approach 1:
The patent introduces a base layer comprising a compound with an oxo acid group as an intermediary between the substrate and the directed self-assembling film. This base layer mediates the interaction between the substrate and the film, enabling uniform phase separation and improving pattern rectangularity. The oxo acid group specifically interacts with the substrate surface to create a controlled interface that promotes desired self-assembly behavior.
Solution Approach 2:
The patent changes the chemical parameters of the substrate interface by using compounds with specific oxo acid groups (carboxylic acid, phosphoric acid, sulfonic acid). This parameter change in the base layer composition modifies the surface properties and energy distribution, leading to improved phase separation uniformity and pattern formation quality.
2Manufacturing precision
If phase separation is promoted in directed self-assembly, then pattern formation is enhanced, but uneven distribution of the compound on the substrate occurs
Solution Approach 1:
The base layer is applied preliminarily to the substrate before forming the directed self-assembling film. This preliminary action of creating a uniform base layer with oxo acid groups ensures that the subsequent film formation process occurs on a pre-conditioned surface, promoting uniform phase separation without compound aggregation or uneven distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables the formation of patterns with enhanced rectangularity and uniformity, suitable for the microfabrication demands of semiconductor and liquid crystal devices, by promoting phase separation and reducing uneven distribution of the compound on the substrate.
Implementation Method 1
a directed self-assembling film including a plurality of phases is overlaid on the substrate subjected to the base treatment
Implementation Method 2
a directed self-assembly lithography process which utilizes a phase separation structure constructed through directed self-assembly, as generally referred to, that spontaneously forms an ordered pattern
Data Source
AI summary
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different.AB)n (1)