Base Generator Adhesion Enhancer for Low Exposure Photosensitive Resins
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Solution Overview
Problem
Negative-type photosensitive resin compositions with amine-based silane coupling agents require increased light exposure for pattern formation, compromising productivity and adhesiveness to substrates.
Innovation Solution
Incorporation of a specific compound represented by formula (1) as a base generator and adhesion enhancer, which generates a base upon electromagnetic wave irradiation or heating without cyclization, enhancing adhesiveness at low light exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an amine-based silane coupling agent is contained as an adhesion enhancer, then adhesiveness to substrate is improved, but light exposure must be increased for pattern formation
Solution Approach 1:
The patent merges the functions of adhesion enhancer and base generator into a single compound. The compound contains both the amine-based silane coupling agent structure for adhesion enhancement and a base generator structure that releases base upon electromagnetic wave irradiation, eliminating the need for separate components and reducing light exposure requirements
Solution Approach 2:
The compound serves multiple functions simultaneously: it acts as an adhesion enhancer through its silane coupling agent structure, a base generator through its base-generating capability upon irradiation, and a micropatterning agent through its overall molecular design. This multi-functionality resolves the contradiction by combining benefits that previously required separate components
2Reliability
If a base generator is used that undergoes cyclization reaction, then base is generated, but optical energy is consumed reducing micropatterning property
Solution Approach 1:
The patent extracts the cyclization reaction step from the base generation mechanism. Instead of requiring cyclization, the compound directly generates base through electromagnetic wave irradiation or heating. This removes the harmful side effect of optical energy consumption while preserving the beneficial base generation function
Solution Approach 2:
The patent changes the reaction mechanism parameters by designing a compound structure that generates base without cyclization. The molecular structure includes specific groups that can directly release base upon irradiation or heating, changing the energy pathway from cyclization-dependent to direct base release, thereby improving micropatterning properties
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The compound enables the formation of patterns with favorable adhesiveness at reduced light exposure, improving productivity and micropatterning properties in negative-type photosensitive resin compositions.
Implementation Method 1
the compound represented by the above formula (1) generates a base by electromagnetic wave irradiation or heating
Implementation Method 2
since the compound represented by the above formula (1) attains the effect of enhancing adhesion to a substrate
Data Source
AI summary
Provided is a novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound according to the present invention is represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.