Batch Panel Atomic Layer Deposition Chamber for Uniform Quantum Dot Films
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Solution Overview
Problem
Existing atomic layer deposition processes struggle to form uniform films on quantum dots due to agglomeration and surface reactivity, leading to reduced optical properties and shortened lifespan of quantum dot-based LEDs.
Innovation Solution
A batch type panel atomic layer deposition apparatus with a rotary vacuum chamber and shaft seal device, allowing for simultaneous processing of multiple panels, which includes a staggered arrangement of concave and convex portions to agitate quantum dots and a system of pipelines for gas flow, ensuring uniform film deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If quantum dots are processed using conventional atomic layer deposition, then film deposition can be performed, but the film thickness is non-uniform due to contact points between neighboring quantum dots blocking precursor gas access
Solution Approach 1:
The patent applies the dynamics principle by rotating the substrate holder during atomic layer deposition. This rotation dynamically changes the orientation and position of quantum dots relative to the precursor gas flow, preventing permanent blockage by contact points and ensuring uniform film deposition across all quantum dot surfaces.
2Ease of manufacture
If quantum dots are made into package glue for LEDs, then LED manufacturing is enabled, but agglomeration occurs that reduces optical properties
Solution Approach 1:
The patent applies preliminary action by forming a protective film on quantum dot surfaces before they are used as LED package glue. This pre-formed film prevents agglomeration during subsequent handling and processing, preserving the optical properties while enabling LED manufacturing.
Solution Approach 2:
The patent uses atomic layer deposition to create an inert protective environment around quantum dots. The deposited film acts as a barrier that prevents direct contact between quantum dots and external environment, reducing agglomeration and preserving optical properties during LED manufacturing processes.
3Productivity
If quantum dots are exposed to air and moisture after LED packaging, then oxidation occurs that shortens quantum dot lifespan
Solution Approach 1:
The patent applies the inert atmosphere principle by depositing a protective film that creates a barrier between quantum dots and external air/moisture. This film maintains an inert environment around the quantum dots, preventing oxidation and extending LED service life.
Solution Approach 2:
The patent uses thin film deposition to create a protective shell around quantum dots. This flexible thin film acts as a barrier that prevents harmful air and moisture from reaching the quantum dot surface, thereby preventing oxidation and extending device lifespan.
4Productivity
If multiple panels are processed simultaneously in batch mode, then productivity increases, but device complexity increases due to rotation and sealing requirements
Solution Approach 1:
The patent applies the merging principle by combining multiple processing functions into a single rotating vacuum chamber system. The rotation mechanism, sealing system, and batch processing capability are integrated into one unified apparatus, enabling simultaneous processing of multiple panels while managing device complexity through functional integration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables uniform thin film formation on quantum dots, preventing agglomeration and oxidation, thereby enhancing the performance and longevity of quantum dot-based LEDs.
Implementation Method 1
the rotary drive assembly is connected to the vacuum chamber through the shaft seal device to drive the vacuum chamber to rotate about the rotational axis
Implementation Method 2
the industry will form a thin film with a thickness of nanometer scale on the surface of the quantum dots by atomic layer deposition (ALD)
Implementation Method 3
The shaft seal device includes an outer shaft tube and a center shaft tube... configured to rotate the outer shaft tube, so as to drive the vacuum chamber to rotate
Data Source
AI summary
A batch type panel atomic layer deposition apparatus includes a vacuum chamber, a shaft seal device, and a rotary drive assembly. The vacuum chamber includes a front wall, a rear wall, and a peripheral wall. The peripheral wall connects edges of the front wall and the rear wall to form a reaction space therebetween. Concave portions and convex portions are provided on an inner side of the peripheral wall in a staggered configuration. The bottom of each of the concave portions is a planar surface. One end of the shaft seal device is connected to the rear wall. The rotary drive assembly is connected to the other end of the shaft seal device, such that the rotary drive assembly is connected to the vacuum chamber through the shaft seal device to drive the vacuum chamber to rotate about the rotational axis.