Bead Mill pH Control for Nanoparticle Purity

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Solution Overview

Problem

The existing bead mill grinding processes often result in contamination of the ground particles due to wear of the grinding medium and mill components, which is particularly problematic in high-purity applications such as electronic components and pharmaceuticals.

Innovation Solution

The method involves controlling the pH of the slurry during the grinding process in a bead mill, using a dispersion medium that may include sodium linear alkylbenzene sulfonate, monoalkyl phosphate, sodium lauryl sulfate, cellulose polymer, or vinyl polymer, and adjusting the pH with acidic or basic substances to a range of 6.5 to 9.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If wet-grinding using a bead mill is performed to achieve fine particle size, then particle refinement capability is improved, but contamination from bead and mill component wear increases

Engineering Contradiction:
Improveparticle size controlVSAvoidcontamination from wear
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent changes the chemical parameter (pH) of the slurry from acidic to neutral or basic range (pH 6.5-9.0). This parameter change reduces the reactivity between the slurry and bead/mill surfaces, thereby minimizing wear-related contamination while preserving the mechanical grinding function for particle size reduction

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces a dispersion medium as an intermediary substance between the grinding components (beads and mill walls) and the material to be ground. This dispersion medium forms a protective boundary layer that reduces direct contact and friction, thereby reducing wear and contamination while still allowing effective particle refinement

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If traditional bead mill grinding is used without pH control, then the grinding process is simple, but contamination levels are high

Engineering Contradiction:
Improveprocess simplicityVSAvoidimpurity content
Core Design Contradiction:
Ease of manufactureVSObject-generated harmful factors

Solution Approach 1:

The patent implements a straightforward parameter change by adjusting and maintaining the slurry pH in the neutral to basic range (pH 6.5-9.0) during grinding. This simple parameter control significantly reduces contamination from bead and mill component wear while maintaining effective particle refinement, making it easy to implement in existing bead mill systems

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly reduces contamination from the beads and mill components, achieving impurity levels less than 50 ppm, thereby enhancing the purity and quality of the ground particles.

Implementation Method 1

The bead mill is a machine that gives a large amount of kinetic energy to beads by agitating a grinding medium (beads) with an agitator in a grinding chamber, and makes the particles finer by collision force and shearing force of the beads

Methodology Applied
Scientific EffectCollision force: Impact Force

Implementation Method 2

The bead mill is a machine that gives a large amount of kinetic energy to beads by agitating a grinding medium (beads) with an agitator in a grinding chamber, and makes the particles finer by collision force and shearing force of the beads

Methodology Applied
Scientific EffectShearing force: Shear Stress

Implementation Method 3

the contamination caused by grinding process can be reduced by controlling the pH of the slurry of the material to be ground during the grinding process by bead mill

Methodology Applied
Scientific EffectpH control effect:

Data Source

PatentUS12285526B2Nanoparticle composition with reduced contaminant and production method thereof
Publication Date: 2025.04.29 SHIONOGI & CO LTD
  • US12285526B2 patent drawing
  • US12285526B2 patent drawing
  • US12285526B2 patent drawing

AI summary

A method for the production of the present disclosure comprises: a) a step of agitating a mixture containing a material to be ground, beads and a dispersion medium in a bead mill; and b) a step of adjusting the pH of the mixture.This method reduces a contamination caused by grinding process using a bead mill.