Beam Absorber Structure for Charge-Stable Multi-Beam Patterning
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Solution Overview
Problem
In particle-beam processing devices, the accumulation of secondary charged particles at the aperture and opening array devices due to blocked beamlets leads to electric charge accumulation, which generates unwanted beamlet deflection and degrades pattern fidelity, especially when there are regions with low electric conductivity caused by contamination or residual gas decomposition.
Innovation Solution
Incorporating an absorber array device downstream of the aperture array device with charged-particle absorbing structures, such as recesses or blind holes, to absorb secondary particles and reduce charge accumulation, along with an electrically conductive coating to enhance charge dissipation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If beamlets are blocked by the opening array device to select subsets of beamlets, then beam pattern selection is achieved, but secondary charged particles are generated and accumulate leading to charge buildup and beamlet deflection
Solution Approach 1:
An absorber array device is introduced as an intermediary component between the opening array device and the target. This absorber array includes absorbing structures positioned to intercept secondary charged particles generated when beamlets are blocked by the opening array device, preventing these particles from accumulating and causing charge buildup that would deflect beamlets.
Solution Approach 2:
The harmful secondary charged particles generated by blocking beamlets are redirected onto dedicated absorbing structures. By converting the harmful effect of particle generation into a controlled absorption process, the system prevents charge accumulation and beamlet deflection while maintaining the ability to select beam patterns through the opening array device.
2Reliability
If regions with low electric conductivity exist due to contamination or residual gas decomposition, then charge dissipation is reduced, but beamlet alignment and pattern fidelity are degraded
Solution Approach 1:
The harmful function of charge accumulation is extracted and isolated by providing dedicated absorbing structures in the absorber array device. These structures are specifically designed to capture and contain secondary charged particles, removing them from the system before they can contribute to charge buildup on the opening array device or cause beamlet deflection, thereby maintaining pattern fidelity.
Solution Approach 2:
The absorber array device serves as an intermediary that captures secondary charged particles before they can interact with regions of low electric conductivity. By intercepting these particles on dedicated absorbing structures, the system prevents charge dissipation issues in contaminated or low-conductivity regions, maintaining reliable beamlet alignment and pattern fidelity.
3Adaptability or versatility
If multiple sets of apertures are arranged in interlacing patterns to increase beamlet options, then beam pattern versatility is improved, but the complexity of aligning apertures with openings and blanking openings increases
Solution Approach 1:
The aperture array device is segmented into multiple sets of apertures arranged in interlacing patterns, with each set capable of being independently aligned with the opening array device. This segmentation allows for modular alignment where each aperture set can be positioned separately, reducing the overall alignment complexity while maintaining high beam pattern versatility.
Solution Approach 2:
The system incorporates dynamic alignment capabilities that allow the aperture array device to be repositioned relative to the opening array device. This dynamic adjustment enables selective alignment of different aperture sets with the openings, providing versatile beam pattern options while simplifying the alignment process through programmable positioning rather than fixed complex geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively eliminates secondary particle emission and charge accumulation, improving beamlet alignment and pattern fidelity by absorbing charged particles and dissipating electric charge, thus enhancing the precision of beamlet projection.
Implementation Method 1
an absorber array device which includes a charged-particle absorbing structure configured to absorb charged particles of some of the beamlets formed by the aperture array device and impinging on the absorber array device
Implementation Method 2
a plurality of electrostatic deflector electrodes, each of which is associated with a blanking opening and is configured to deflect a beamlet traversing the respective blanking opening by an amount sufficient to deflect the beamlet off its nominal path when an activating electric voltage is applied to the respective electrode
Data Source
AI summary
A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having openings configured for the passage of at least a subset of beamlets that are formed by the apertures. The absorber array device comprises openings corresponding to one of the aperture arrangement sets, whereas it includes a charged-particle absorbing structure comprising absorbing regions surrounded by elevated regions and configured to absorb charged particles impinging thereupon at locations corresponding to apertures of the other aperture arrangements of the aperture array device, effectively confining the effects of irradiated particles and electric charge therein.