Charged Particle Beam Cross-Section Deformation for Exposure
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Solution Overview
Problem
Conventional exposure apparatuses using a one-dimensional array beam have insufficient current values for practical exposure rates, limiting processing capacity.
Innovation Solution
An exposure apparatus with a formation module that includes a particle source, an aperture array device, an illumination lens, and a beam cross-section deformation device, configured to form charged particle beams with different irradiation positions and cross-sectional shapes, enhancing current values by expanding the beam cross-section.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a one-dimensional array beam is formed using conventional exposure apparatus, then the beam arrangement is simple, but the current value of each beam is insufficient for practical exposure rates
Solution Approach 1:
The invention changes the geometric parameters of the emission region and beam cross-section. By creating an emission region with different widths in longitudinal and lateral directions, and deforming the beam cross-section into a longer and thinner shape, the apparatus achieves higher current values per beam while maintaining practical exposure rates
Solution Approach 2:
The invention transitions from a conventional symmetric beam configuration to an asymmetric configuration by introducing dimensional differences in the emission region. The beam cross-section is deformed to have different dimensions in longitudinal versus lateral directions, creating a longer and thinner shape that increases current density
2Productivity
If the current value of each beam is increased to enhance processing capacity, then productivity improves, but beam cross-section control becomes more difficult
Solution Approach 1:
The invention performs preliminary deformation of the beam cross-section before the beams reach the aperture array device. By pre-shaping the beams into a longer and thinner configuration, the system achieves higher current values without requiring complex real-time control during the exposure process
Solution Approach 2:
The invention introduces an intermediary beam cross-section deformation device between the particle source and the aperture array device. This intermediary component facilitates the transformation of the beam cross-section shape, enabling current value enhancement while maintaining manageable system complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution increases the current value of each beam in the array, thereby enhancing the processing capacity of the exposure apparatus.
Implementation Method 1
a beam cross-section deformation device provided between the particle source and the aperture array device, and configured to deform a cross-sectional shape of the charged particle beams into a longer and thinner shape than a shape of the emission region by an action of any of a magnetic field and an electric field
Implementation Method 2
a beam cross-section deformation device provided between the particle source and the aperture array device, and configured to deform a cross-sectional shape of the charged particle beams into a longer and thinner shape than a shape of the emission region by an action of any of a magnetic field and an electric field
Implementation Method 3
an illumination lens provided between the particle source and the aperture array device
Data Source
AI summary
The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.