Charged Particle Beam Deflection for Continuous Stage Movement
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Solution Overview
Problem
In overlay drawing using a charged particle beam, the discontinuous movement of the substrate stage due to the need to correct the position of the drawing region over adjacent shot patterns reduces throughput and lowers the precision of relative alignment between the charged particle beams and the substrate, as only one shot pattern can be corrected before moving the stage in the opposite direction.
Innovation Solution
A drawing apparatus with a stage and charged particle optical systems that allow continuous movement along a first axis, using a controller to control the deflection of charged particle beams for displacement, enabling simultaneous irradiation and positioning on multiple regions without discontinuous stage movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the drawing region of a charged particle optical system extends over shot patterns adjacent in the substrate moving direction, then the position of the drawing region can be corrected with respect to shot patterns, but the stage must move discontinuously in opposite directions, reducing throughput and alignment precision
Solution Approach 1:
The patent divides the drawing region into multiple independent drawing regions, each corresponding to a specific shot pattern. By segmenting the continuous drawing region into discrete units, the system can independently control and correct the position for each shot pattern without requiring discontinuous stage movement, thus maintaining both alignment precision and throughput
Solution Approach 2:
The patent introduces a deflection direction that is independent of the substrate moving direction. By using deflectors to adjust the position of charged particle beams in this additional dimension, the system can correct alignment errors without moving the stage in reverse, eliminating discontinuous movement while maintaining correction capability
2Manufacturing precision
If the stage moves discontinuously in opposite directions to correct drawing region position, then alignment correction is achieved, but the reproducibility of stage position control lowers and precision of relative alignment decreases
Solution Approach 1:
The patent replaces the mechanical stage movement mechanism with an electromagnetic deflection mechanism. Instead of moving the stage mechanically in opposite directions to correct position, the system uses deflectors to adjust the charged particle beam positions electromagnetically, eliminating mechanical reversals and improving both reproducibility and precision
Solution Approach 2:
The patent makes the drawing region position dynamically adjustable through deflector control during the drawing process. By enabling real-time position adjustment without mechanical stage reversal, the system maintains high reproducibility of stage position control while achieving the necessary alignment corrections
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach maintains high precision in overlay drawing and increases throughput by allowing continuous movement of the substrate stage while ensuring accurate alignment between charged particle beams and the substrate, enhancing the reproducibility of position control.
Implementation Method 1
a charged particle optical system having a function of deflecting the plurality of charged particle beams to perform displacement of the plurality of charged particle beams on the substrate
Implementation Method 2
a function of blanking at least a portion of the plurality of charged particle beams
Data Source
AI summary
The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, including a stage configured to hold the substrate and be moved, a charged particle optical system configured to irradiate a plurality of charged particle beams arrayed along a first axis, and a controller configured to control the drawing so as to perform multiple irradiation of a target portion on the substrate with the plurality of charged particle beams, wherein the controller configured to control the drawing such that the stage is moved in one direction along the first axis with respect to a plurality of regions formed on the substrate along the first axis, and a deflection of charged particle beam for a displacement of charged particle beam along the first axis is performed with respect to drawing on each of the plurality of regions.