Charged Particle Beam Drawing Aperture Segmentation
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Solution Overview
Problem
Charged particle beam drawing apparatuses face limitations in throughput due to the small size of the subfield, which restricts the maximum deflection of the charged particle beam without distortion, preventing efficient pattern drawing on workpieces.
Innovation Solution
The apparatus includes a drawing data correcting process that adjusts the position and shape of the charged particle beam by using a combination of deflectors and aperture members, allowing for larger subfields and increased throughput by optimizing the beam's path and application on the workpiece.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the charged particle beam is offset by a sub-deflector to cancel position difference, then the position accuracy is improved, but the subfield size becomes smaller than the limit area, reducing throughput
Solution Approach 1:
The patent divides the aperture member into multiple segments (first aperture member and second aperture member) that can be independently positioned. This segmentation allows the system to achieve both precise beam positioning and larger subfield coverage by coordinating the positions of multiple aperture segments rather than relying solely on sub-deflector offsetting.
Solution Approach 2:
The patent introduces aperture members as intermediary elements between the charged particle beam source and the workpiece. These aperture members mediate the beam formation and positioning process, enabling larger subfield sizes while maintaining position accuracy through the coordinated positioning of multiple aperture segments.
2Productivity
If the subfield size is increased to improve throughput, then the productivity is improved, but the charged particle beam cannot be deflected without distortion, limiting the maximum deflection capability
Solution Approach 1:
By segmenting the aperture system into multiple independently positionable aperture members, the patent enables each segment to be optimized for specific deflection ranges. This allows the overall system to achieve larger effective subfield coverage while each individual aperture segment maintains beam quality within its operational range.
Solution Approach 2:
The patent employs dynamic positioning of multiple aperture members to adapt the aperture configuration based on the required beam deflection. This dynamic adjustment allows the system to maintain optimal beam quality across larger subfield areas by reconfiguring which aperture segments are active for different regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the drawing of larger patterns and increases the apparatus's throughput by allowing for greater deflection of the charged particle beam without distortion, enhancing the efficiency of pattern creation on workpieces.
Implementation Method 1
the charged particle beam is offset by a sub-deflector
Implementation Method 2
a charged particle beam passed through an opening of a first forming aperture member and an opening of a second forming aperture
Data Source
AI summary
A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.