Charged Particle Beam Generator Cooling and Shielding
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Solution Overview
Problem
Charged particle lithography systems face challenges in achieving high throughput while maintaining low error margins due to heating issues caused by increased beamlets and high voltages, which affect accuracy and reliability, and require effective pressure management to reduce contamination and electron beam-induced deposition.
Innovation Solution
A charged particle beam generator with a high voltage shielding arrangement and a cooling system, incorporating a collimator with an Einzel lens and aperture array, uses a wire mesh structure for shielding and active cooling to manage heat and reduce contamination, while maintaining a vacuum environment through differential pumping and an intermediate vacuum chamber to control pressure differentials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the number of beamlets is increased to achieve higher throughput, then productivity is improved, but heating of components increases and manufacturing precision deteriorates
Solution Approach 1:
A liquid cooling intermediary system is introduced between the charged particle beam source and the aperture plate. The cooling system includes cooling channels that circulate liquid to actively remove heat generated by charged particle interactions, preventing thermal accumulation that would otherwise degrade patterning accuracy while enabling sustained high-current operation for improved throughput.
Solution Approach 2:
The patent changes the thermal management parameter from passive heat dissipation to active liquid cooling. By introducing forced convection through cooling channels with circulating liquid, the system can handle higher beam currents and larger numbers of beamlets without reaching critical temperature thresholds that would compromise patterning precision.
2Speed
If high voltage is applied to strengthen electric fields and shorten particle path, then speed is improved, but reliability deteriorates due to accidental charging of components
Solution Approach 1:
A conductive coating intermediary layer is applied to insulating components within the high voltage region. This conductive layer, maintained at appropriate potential, acts as a protective intermediary that prevents accidental charging of insulating parts while allowing the high voltage electric fields to accelerate charged particles at high speed through the column.
Solution Approach 2:
The patent creates an electrically inert environment by coating insulating components with conductive material. This conductive coating environment prevents the accumulation of static charge on insulating surfaces that would otherwise occur in high voltage fields, thereby maintaining system reliability while enabling high voltage operation for improved particle transit speed.
3Productivity
If current is increased to handle more beamlets, then productivity is improved, but temperature increases causing harmful thermal effects
Solution Approach 1:
A liquid cooling intermediary system is introduced between the charged particle beam source and the aperture plate. The cooling system includes cooling channels that circulate liquid to actively remove heat generated by charged particle interactions, preventing thermal accumulation that would otherwise degrade patterning accuracy while enabling sustained high-current operation for improved throughput.
Solution Approach 2:
The patent employs hydraulic cooling through liquid circulation in cooling channels. This fluid-based heat removal system efficiently transfers thermal energy from high-current beam components to the circulating liquid, enabling sustained high current operation for increased productivity without excessive temperature rise.
4Reliability
If high voltage shielding is implemented to protect components, then reliability is improved, but device complexity increases
Solution Approach 1:
The conductive coating serves multiple functions simultaneously: it provides high voltage shielding to prevent accidental charging of insulating components, maintains electrical equipotential surfaces to control electric field distribution, and can be integrated with existing component geometries. This multi-functionality achieves reliable high voltage protection without proportionally increasing device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the performance of charged particle beam generators by reducing heating and contamination, improving accuracy and reliability, and achieving the required pressure management to support high-throughput and low-error lithography processes.
Implementation Method 1
a cooling arrangement for removing heat generated within the collimator system
Implementation Method 2
cooling arrangement...incorporating a collimator with an Einzel lens and aperture array, uses a wire mesh structure for shielding and active cooling
Implementation Method 3
achieving the required pressure management to support high-throughput and low-error lithography processes
Implementation Method 4
maintaining a vacuum environment through differential pumping and an intermediate vacuum chamber to control pressure differentials
Implementation Method 5
incorporating a collimator with an Einzel lens and aperture array
Implementation Method 6
uses stronger electric fields along the charged particle path, which may be the result of applying higher voltages to certain electrodes
Implementation Method 7
uses a wire mesh structure for shielding...high voltage shielding arrangement
Data Source
AI summary
The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.