Beam Intensity Uniformizing Element with Cross-Direction Lens Marks
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Solution Overview
Problem
Conventional beam intensity uniformizing elements with linear machining marks on lens cells cause interference patterns, leading to increased production complexity and cost due to the need for individual machining adjustments on each lens cell.
Innovation Solution
A beam intensity uniformizing element with two lens arrays on opposite surfaces of an optical base, where the linear marks on each array extend in different directions, preventing interference patterns and allowing for consistent machining pitches, thus reducing production complexity and cost.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the pitches of linear marks on adjacent lens cells are changed to suppress interference patterns, then interference patterns are suppressed, but machining complexity and production cost increase significantly
Solution Approach 1:
The patent applies asymmetry by making the linear marks on the first lens array extend in a first direction while linear marks on the second lens array extend in a second direction that is different from the first direction. This asymmetric arrangement prevents the linear marks from aligning and forming interference patterns, while maintaining consistent machining pitches on both arrays, thereby suppressing interference without increasing machining complexity
2Object-affected harmful factors
If individual machining adjustments are made on each lens cell to change linear mark pitches, then interference patterns are suppressed, but production cost increases
Solution Approach 1:
The patent employs universality by using the same machining pitch for both the first and second lens arrays. The mold includes a first molding surface for forming the first lens array and a second molding surface for forming the second lens array, both with identical pitch specifications. This universal approach allows standardized manufacturing processes to be applied to both arrays simultaneously, eliminating the need for individual adjustments and reducing production costs while still preventing interference through the directional asymmetry of the linear marks
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Suppresses interference patterns and reduces production costs by simplifying machining processes and optimizing cutting pitches, enhancing precision and ease of integration into light source devices.
Implementation Method 1
a beam intensity uniformizing element includes an optical base, a first lens array disposed at a front surface of the optical base, and a second lens array disposed at a back surface of the optical base
Data Source
AI summary
A beam intensity uniformizing element includes an optical base, a first lens array disposed at a front surface of the optical base; and a second lens array disposed at a back surface of the optical base. The first lens array includes first mold lens cells arranged in different directions along the front surface of the optical base. The first mold lens cells have surfaces constituting the front surface of the optical base. The surfaces of the first mold lens cells have first linear marks thereon extending in a first direction. The second lens array includes second mold lens cells arranged in different directions along the back surface of the optical base. The second mold lens cells have surfaces constituting the back surface of the optical base. The surfaces of the second mold lens cells have second linear marks thereon extending in a second direction different from the first direction. This element suppresses generation of an interference pattern and reduces cost.