Beam-Light Alignment Using a Position Mark in Charged Particle Imaging

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Solution Overview

Problem

Charged particle beam apparatuses face issues with misalignment of the irradiation positions of the primary charged particle beam and electromagnetic wave, leading to non-uniform light distribution and instability in secondary electron observation signals, affecting the accuracy of electrical and material property evaluations.

Innovation Solution

A charged particle beam apparatus with a position adjustment mark and detectors for both beams and light, utilizing a computer system to align the irradiation positions of the beam and light by generating and displaying images based on detection signals, allowing precise adjustment of the relative positional relationship.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If the irradiation position of the beam and light are aligned based on user manipulation, then the device complexity is reduced, but the manufacturing precision and measurement precision of irradiation position alignment deteriorate

Engineering Contradiction:
Improvealignment mechanism complexityVSAvoidirradiation position alignment precision
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

A position adjustment mark is introduced as an intermediary object on the sample stage. This mark serves as a reference target that both the beam and light can be aligned to, enabling precise alignment without complex mechanical coupling mechanisms. The mark acts as a mediator between the beam irradiation system and light irradiation system, allowing independent adjustment of each while achieving precise coincidence of their irradiation positions.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Device complexity

If the light irradiation area and beam irradiation position are aligned manually, then the device complexity is reduced, but the measurement precision of irradiation position coincidence deteriorates

Engineering Contradiction:
Improvealignment system complexityVSAvoidirradiation position coincidence precision
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The system employs feedback through visual observation of the position adjustment mark. The mark is designed to be observable under both beam irradiation and light irradiation, providing visual feedback that allows the operator to adjust the light irradiation position until it coincides with the beam irradiation position. This feedback mechanism enables precise alignment without requiring complex automated measurement systems.

Inventive Principle:
Principle #23Feedback

3Ease of operation

If the irradiation position of beam and light are not precisely aligned, then the ease of operation is improved, but the reliability of secondary electron observation signal deteriorates

Engineering Contradiction:
Improvealignment adjustment easeVSAvoidsecondary electron signal stability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The position adjustment mark serves as a visual mediator that enables easy alignment adjustment. By providing a clearly observable reference target that appears in both beam and light irradiation fields, the operator can easily adjust the light position to coincide with the beam position. This simple visual feedback mechanism improves ease of operation while ensuring reliable secondary electron signal observation through precise alignment.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus achieves high-accuracy alignment of the irradiation positions, stabilizing the secondary electron image luminance and ensuring accurate evaluation of electrical and material properties.

Implementation Method 1

a charged particle source that generates a charged particle beam with which a sample is irradiated; a first detector that detects secondary charged particles obtained by irradiating the sample with the charged particle beam

Methodology Applied
Scientific EffectSecondary electron emission: Electron Impact Desorption

Implementation Method 2

a light source that generates a light with which the sample is irradiated; a second detector that detects a secondary light obtained by irradiating the position adjustment mark with the light

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS12437962B2Charged particle beam apparatus
Publication Date: 2025.10.07 HITACHI HIGH TECH CORP
  • US12437962B2 patent drawing
  • US12437962B2 patent drawing
  • US12437962B2 patent drawing

AI summary

Provided is a technique and the like capable of specifying irradiation areas or irradiation positions of a beam and a light as clearly as possible. A charged particle beam apparatus 1 includes: a position adjustment mark 10 provided on a stage 6 and irradiated with a beam bl and a light a1; and a mechanism setting an irradiation position of the beam bl and an irradiation position of the light a1 with respect to the stage 6 and changing a relative positional relationship including a distance between the irradiation position of the light a1 and the stage 6. A computer system 2 generates a first image in which the position adjustment mark 10 is reflected based on a first detection signal obtained by irradiating the position adjustment mark 10 with the beam b1, generates a second image in which an irradiation area of the light a1 is reflected in the vicinity of the position adjustment mark 10 based on a second detection signal obtained by irradiating the position adjustment mark 10 with the light a1, and adjusts an irradiation position of the beam b1 and an irradiation position of the light a1 based on the first image and the second image obtained when a positional relationship is changed by the mechanism.